Polymeric polishing pad having continuously regenerated work surface

An article for altering a surface of a workpiece, comprising:

• a work surface and a subsurface proximate to said work surface,
• said work surface being exposed to a working environment during said altering and being softened relatively softer than said subsurface as a result of exposure to said working environment, wherein a portion of said subsurface immediately adjacent to said work surface becomes exposed to said working environment as said work surface wears during said altering, and said portion of said subsurface regenerates said work surface by being softened as a result of exposure to, said working environment, and further wherein,
• said article has a texture increasing said work surface being exposed to said working environment and being softened relatively softer than said subsurface as a result of said exposure to said working environment, said texture including artifacts arranged in a fractal pattern.

An article for altering a surface of a workpiece, comprising:

• a polymeric matrix having a work surface and a subsurface proximate to said work surface,
• said work surface being exposed to a working environment during said altering and being softened relatively softer than said subsurface as a result of exposure to said working environment, wherein as said work surface wears during said altering, said work surface is regenerated by said subsurface becoming exposed to said working environment and becoming softened as a result of exposure to said working environment, and further wherein,
• said work surface has a texture increasing said work surface being exposed to said working environment and being softened relatively softer than said subsurface as a result of said exposure to said working environment, said texture including artifacts arranged in a fractal pattern.