Polishing apparatus and polishing method using the same
AssigneeTokyo Electron Limited
InventorsToshiyasu Beppu, Junji Watanabe
Life of this patent
Estimating the term…
Abstract
A polishing apparatus includes a rotatable sample holder for holding a substrate which has a rugged surface, a rotatable polishing table, a polishing cloth adapted to contact the substrate which is held on said sample holder, a device for supplying a polishing reagent between said polishing cloth and the substrate which is held on the sample holder, an elastic member arranged between the polishing table and the polishing cloth. The polishing cloth is fixed to the polishing table in a tensioned state without being adhered to the elastic member.
Claims14
A polishing apparatus comprising:
- a rotatable sample holder for holding a substrate;
- a rotatable polishing table;
- a polishing cloth covering said polishing table;
- a supply unit supplying a polishing reagent between said polishing cloth and the substrate which is held on said sample holder;
- and
- an elastic member arranged between said polishing table and said polishing cloth, said elastic member being provided with elasticity by a fluid encapsulated therein,
- wherein said polishing cloth includes a central portion and a peripheral portion, said polishing cloth being fixed to said polishing table only at said central portion and said peripheral portion of said polishing cloth.
A polishing apparatus comprising:
- a rotatable sample holder for holding a substrate;
- a rotatable polishing table;
- a polishing cloth covering said polishing table;
- a supply unit supplying a polishing reagent between said polishing cloth and the substrate which is held on said sample holder;
- and
- an elastic member arranged between said polishing table and said polishing cloth, said elastic member being provided with elasticity by a fluid encapsulated therein,
- wherein said polishing cloth includes a peripheral portion, said peripheral portion of said polishing cloth being secured between a pair of fixing rings, said fixing rings being secured to said polishing table to fix said polishing cloth to said polishing table.
A polishing apparatus comprising:
- a rotatable sample holder for holding a substrate;
- a rotatable polishing table;
- a polishing cloth covering said polishing table;
- a supply unit supplying a polishing reagent between said polishing cloth and the substrate which is held on said sample holder;
- and
- an elastic member arranged between said polishing table and said polishing cloth, said elastic member being provided with elasticity by a fluid encapsulated therein,
- wherein said polishing cloth includes a central portion, said central portion of said polishing cloth being fixed to said polishing table by way of a fixing plate so that the polishing cloth is positioned between said polishing table and said fixing plate.
A polishing apparatus, comprising:
- a rotatable sample holder for holding a substrate;
- a rotatable polishing table;
- a polishing cloth covering said polishing table;
- a supply unit supplying a polishing reagent between said polishing cloth and the substrate which is held on said sample holder;
- an elastic member arranged between said polishing table and said polishing cloth, said elastic member being provided with elasticity by a fluid encapsulated therein;
- and
- a control unit controlling a pressure of the fluid encapsulated in said elastic member.
A polishing apparatus comprising:
- a rotatable sample holder for holding a substrate;
- a rotatable polishing table;
- a polishing cloth covering said polishing table;
- a supply unit supplying a polishing reagent between said polishing cloth and the substrate which is held on said sample holder;
- and
- an elastic member arranged between said polishing table and said polishing cloth, said elastic member being provided with elasticity by a fluid encapsulated therein,
- wherein said elastic member is positioned in a groove formed in the polishing table.
Dependencies are inferred from the claim text.