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AssigneeInternational Business Machines Corporation
InventorMark C. Easton
Estimating the term…
A flow monitoring system (14) for and method of monitoring the flow of processing gases in a wafer processing system (10) during the manufacturing of microelectronic devices. The wafer processing system includes a wafer processing chamber (12) in fluid communication with a gas delivery system (18) via a common conduit (32). The gas delivery system includes a plurality of gas sources (22) each having a flow regulator (24) and a flow meter (26). The flow monitoring system includes a total flow meter (36) in fluid communication with the common conduit between the gas delivery system and the processing chamber. When a gas is flowed into wafer processing chamber from one of the gas sources, the comparator compares a first flow signal from the total flow meter to a second signal from the flow meter corresponding to the active gas source to determine whether or not the corresponding flow regulator is properly calibrated.
A fluid delivery system for supplying at least a first fluid to a processing chamber, comprising:
A processing system, comprising:
A method of monitoring flow within a processing system having a processing chamber, a first flow meter located upstream of and in fluid communication with the processing chamber and a flow regulator located upstream of and in fluid communication with the first flow meter, the flow regulator for controlling the flow of a fluid, the method comprising the steps of:
Dependencies are inferred from the claim text.