Method to produce masking
AssigneeTexas Instruments Incorporated
InventorsMonte A. Douglas, Richard A. Stoltz
Life of this patent
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Abstract
This is a method for masking a structure 12 for patterning micron and submicron features, the method comprises: forming at least one monolayer 32 of adsorbed molecules on the structure; prenucleating portions 46,48 of the adsorbed layer by exposing the portions corresponding to a desired pattern 36 of an energy source 42; and selectively forming build-up layers 66,68 over the prenucleated portions to form a mask over the structure to be patterned. Other methods are also disclosed.
Claims16
A method for masking a structure for patterning micron and submicron features, said method comprising:
- a. forming at least one monolayer of adsorbed molecules on a partially completed integrated circuit structure;
- b. prenucleating portions of said adsorbed layer by exposing said portions corresponding to a desired pattern of an energy source;
- c. selectively forming build-up layers over said prenucleated portions to form a mask over said structure;
- and
- d. etching said structure in areas not covered by said mask to form patterned features.
A method for masking and implanting a structure comprising:
- a. forming at least one monolayer of adsorbed molecules on a partially completed integrated circuit structure;
- b. prenucleating portions of said adsorbed layer by exposing said portions corresponding to a desired pattern of an energy source;
- c. selectively forming build-up layers over said prenucleated portions to form a mask over said structure;
- and
- d. implanting into portions of said structure not covered by said mask.
A method for masking and oxidizing a structure comprising:
- a. forming at least one monolayer of adsorbed molecules on a partially completed integrated circuit structure;
- b. prenucleating portions of said adsorbed layer by exposing said portions corresponding to a desired pattern of an energy source;
- c. selectively forming build-up layers over said prenucleated portions to form a mask over said structure;
- and
- d. oxidizing a surface of said structure not covered by said mask.
Dependencies are inferred from the claim text.