Processing system
AssigneeTokyo Electron Limited
InventorIssei Ueda
Life of this patent
Estimating the term…
Abstract
When both a wafer transfer means in a first transfer device and a wafer transfer means in a second transfer device move downward at the same time, the amount of exhaust air by an exhaust fan is increased by the control of a control section, whereby the down flow of clean air is intensified. Turbulence of air flow caused when both the wafer transfer means in the first transfer device and the wafer transfer means in the second transfer device move downward at the same time is absorbed by the down flow intensified as described above.
Claims13
A processing system, comprising:
- a plurality of transfer devices each for transferring a substrate in a vertical direction;
- and
- means for controlling air flow in said system according to movement of said plurality of transfer devices.
A processing system, comprising:
- a plurality of transfer devices each for transferring a substrate in a vertical direction;
- processing chambers, disposed around said transfer devices, each for processing the substrate;
- and
- means for controlling pressures in said processing chambers according to movement of said transfer devices.
A processing system, comprising:
- a plurality of transfer devices each for transferring a substrate in a vertical direction;
- processing chambers, disposed around said transfer devices, each for processing the substrate;
- and
- means for performing such control that when at least one of said transfer devices moves, gas in said processing chambers is blown out toward said transfer devices.
A processing system, comprising:
- a plurality of transfer devices each for transferring a substrate in a vertical direction;
- processing chambers disposed around said transfer devices and having openings for receiving and sending the substrate from/to said transfer devices, each for processing the substrate;
- shutter members provided at the openings;
- means for controlling the opening and closing of the openings by said shutter members according to movement of said transfer devices.
A processing system, comprising:
- a plurality of transfer devices each for transferring a substrate in a vertical direction;
- processing chambers, disposed around said transfer devices, each for processing the substrate;
- and
- bypass means, disposed near said transfer devices, for allowing air resulting from a rise in pressure caused by said transfer device moving upward to flow thereinto from an inflow port and exhausting the air from an exhaust port.
A processing system, comprising:
- a plurality of transfer devices each for transferring a substrate in a vertical direction;
- processing chambers, disposed around said transfer devices, each for processing the substrate;
- a supply apparatus for supplying clean air from a position above said transfer device into said transfer device;
- and
- means for performing such control that with reference to said transfer device which is to move downward, said transfer device which is to move downward is previously detected, and that said supply apparatus is operated before said transfer device moves downward.
Dependencies are inferred from the claim text.