Post etch cleaning composition and process for dual damascene system
AssigneeEKC Technology, Inc.
InventorsCatherine M. Peyne, David J. Maloney, Shihying Lee, Wai Mun Lee, Leslie W. Arkless
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Abstract
A new cleaning chemistry based on a choline compound, such as choline hydroxide, is provided in order to address the problem of dual damascene fabrication. An etch stop inorganic layer at the bottom of a dual damascene structure protects the underlying interconnect of copper and allows a better cleaning. A two step etch process utilizing the etch stop layer is used to achieve the requirements of UISI manufacturing in a dual damascene structure.
Claims22
A process for the removal of etch residues from an integrated circuit using low k dielectric and copper materials, which comprises contacting the integrated circuit with a composition comprising a choline compound, water and an organic solvent at a temperature and for a time sufficient to remove the residue from the integrated circuit.
An integrated circuit fabrication process, which comprises forming a first silicon compound etch stop layer over a copper conducting line in the integrated circuit, forming a second silicon compound bulk dielectric over the first silicon compound etch stop layer, etching the second silicon compound bulk dielectric to expose the etch stop layer, removing etch residues from the integrated circuit, etching away the etch stop layer to expose the copper conducting line, and removing etch residues from the integrated circuit with an etch residue removal composition containing an effective amount of a choline compound.
Dependencies are inferred from the claim text.