Interface texturing for light-emitting device
AssigneeUnited Epitaxxy Company, Ltd.
InventorsTzer-Perng Chen, Chih-Sung Chang, Holin Chang
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Abstract
An interface texturing for light-emitting device is formed by utilizing holographic lithography. Two coherent light beams are overlaid to cause constructive and destructive interference and thereby periodical alternative bright and dark lines are formed. A wafer coated with photoresist material is exposed under the interference lines. After developing step, a photoresist pattern with textured surface is formed on the wafer. Thereafter, the textured photoresist pattern is transferred to the wafer by etching process and result in a desired interface texturing.
Claims14
A method of manufacturing an interface texturing for a light-emitting device, comprising the step of:
- providing a substrate;
- forming a photoresist layer over the substrate;
- performing a first exposure step, which is to project a plurality of interference lines formed by a plurality of overlaid coherent light beams to the photoresist layer;
- performing a step of develop to form a textured pattern on the surface of the photoresist layer;
- and
- performing an etching process to transfer the photoresist pattern to the substrate.
Dependencies are inferred from the claim text.