Stage system and exposure apparatus with the same
AssigneeCanon Kabushiki Kaisha
InventorsShin Matsui, Shinji Ohishi, Eiji Osanai, Tadayuki Kubo
Life of this patent
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Abstract
A stage system includes a first stage movable along a reference plane, containing a vertical direction, and in the vertical direction or in a first direction close to the vertical direction, a second stage movable in a second direction intersecting with the first direction and relative to the first stage, a first driving mechanism for moving the first stage in the first direction, a second driving mechanism for moving the second stage in the second direction, a countermass movable in the first direction, and a third driving mechanism for moving the countermass in a direction opposite to the first direction.
Claims71
A stage mechanism, comprising:
- a first stage movable along a reference plane, containing a vertical direction, wherein said first stage is movable in a first direction corresponding to one of the vertical direction and a direction approximating the vertical direction;
- a second stage movable in a second direction intersecting with the first direction and relative to said first stage;
- a first driving mechanism for moving said first stage in the first direction;
- a second driving mechanism for moving said second stage in the second direction;
- a countermass movable in the first direction, said countermass having a mass balancing with a mass of one of said first and second stages, which moves in the first direction;
- and
- a third driving mechanism for generating a force for moving said countermass in a direction opposite to the first direction.
A stage mechanism, comprising:
- a first stage movable along a reference plane, containing a vertical direction, and in the vertical direction or in a first direction close to the vertical direction;
- a second stage movable in a second direction intersecting with the first direction and relative to the first stage;
- a countermass movable in the first direction;
- a first driving mechanism for moving the first stage in the first direction;
- and
- a second driving mechanism for moving the second stage in the second direction,
- wherein said first driving mechanism includes a magnet and a coil, one of which is mounted on one of the first stage and the countermass and the other of which is mounted on the other of the first stage and the countermass, such that the countermass moves in a direction opposite to the first stage.
A stage system, comprising:
- a stage movable along a reference plane, containing a vertical direction, and in the vertical direction or a direction close to the vertical direction;
- a countermass, balancing with a weight of the stage;
- connecting members for connecting the countermass to the stage;
- a pulley for supporting said connecting members;
- and
- an anti-vibration mechanism for reducing vibration to be propagated from said connecting members to the stage.
A stage system, comprising:
- a stage movable along a reference plane, containing a vertical direction, and in the vertical direction or a first direction close to the vertical direction;
- connecting members connected to the stage;
- a pulley for supporting said connecting members;
- a motor for rotationally driving the pulley and for compensating for a weight of the stage;
- and
- an anti-vibration mechanism for reducing vibration to be propagated from said connecting members to the stage.
A stage system, comprising:
- a stage movable along a reference plane, containing a vertical direction, and in the vertical direction or a direction close to the vertical direction;
- a countermass, balancing with a weight of the stage;
- connecting members for connecting the countermass to the stage;
- a pulley for supporting said connecting members;
- and
- an actuator for adjusting one of a tension force of and an effective length of the connecting members.
An exposure apparatus, comprising:
- a first stage movable along a reference plane, containing a vertical direction, wherein the first stage is movable in a first direction corresponding to one of the vertical direction and a direction approximating the vertical direction;
- a second stage movable in a second direction intersecting with the first direction and relative to the first stage;
- a first driving mechanism for moving the first stage in the first direction;
- a second driving mechanism for moving the second stage in the second direction;
- a countermass movable in the first direction, said countermass having a mass balancing with a mass of one of said first and second stages, which moves in the first direction;
- and
- a third driving mechanism for generating a force for moving the countermass in a direction opposite to the first direction.
An exposure apparatus, comprising:
- a first stage movable along a reference plane, containing a vertical direction, and in the vertical direction or in a first direction close to the vertical direction;
- a second stage movable in a second direction intersecting with the first direction and relative to the first stage;
- a countermass movable in the first direction;
- a first driving mechanism for moving the first stage in the first direction;
- and
- a second driving mechanism for moving the second stage in the second direction,
- wherein said first driving mechanism includes a magnet and a coil, one of which is mounted on one of the first stage and the countermass and the other of which is mounted on the other of the first stage and the countermass, such that the countermass moves in a direction opposite to the first stage.
An exposure apparatus, comprising:
- a stage movable along a reference plane, containing a vertical direction, and in the vertical direction or a direction close to the vertical direction;
- a countermass, balancing with a weight of the stage;
- connecting members for connecting the countermass to the stage;
- a pulley for supporting said connecting members;
- and
- an anti-vibration mechanism for reducing vibration to be propagated from said connecting members to the stage.
An exposure apparatus, comprising:
- a stage movable along a reference plane, containing a vertical direction, and in the vertical direction or a first direction close to the vertical direction;
- connecting members connected to the stage;
- a pulley for supporting said connecting members;
- a motor for rotationally driving the pulley and for compensating for a weight of the stage;
- and
- an anti-vibration mechanism for reducing vibration to be propagated from said connecting members to the stage.
An exposure apparatus, comprising:
- a stage movable along a reference plane, containing a vertical direction, and in the vertical direction or a direction close to the vertical direction;
- a countermass, balancing with a weight of the stage;
- connecting members for connecting the countermass to the stage;
- a pulley for supporting said connecting members;
- and
- an actuator for adjusting one of a tension force of and an effective length of the connecting members.
A device manufacturing method, comprising the steps of:
- applying a photosensitive material to a wafer;
- exposing the wafer by use of an exposure apparatus;
- and
- developing the exposed wafer,
- wherein the exposure apparatus comprises (i) a first stage movable along a reference plane, containing a vertical direction, wherein the first stage is movable in a first direction corresponding to one of the vertical direction and a direction approximating the vertical direction, (ii) a second stage movable in a second direction intersecting with the first direction and relative to the first stage, (iii) a first driving mechanism for moving the first stage in the first direction, (iv) a second driving mechanism for moving the second stage in the second direction, (v) a countermass movable in the first direction, the countermass having a mass balancing with a mass of one of the first and second stages, which moves in the first direction, and (vi) a third driving mechanism for generating a force for moving the countermass in a direction opposite to the first direction.
A device manufacturing method, comprising the steps of:
- applying a photosensitive material to a wafer;
- exposing the wafer by use of an exposure apparatus;
- and
- developing the exposed wafer,
- wherein the exposure apparatus comprises (i) a stage movable along a reference plane, containing a vertical direction, and in the vertical direction or a direction close to the vertical direction, (ii) a countermass, balancing with a weight of the stage, (iii) connecting members for connecting the countermass to the stage, (iv) a pulley for supporting the connecting members, and (v) an anti-vibration mechanism for reducing vibration to be propagated from the connecting members to the stage.
A device manufacturing method, comprising the steps of:
- applying a photosensitive material to a wafer;
- exposing the wafer by use of an exposure apparatus;
- and
- developing the exposed wafer,
- wherein the exposure apparatus comprises (i) a stage movable along a reference plane, containing a vertical direction, and in the vertical direction or a first direction close to the vertical direction, (ii) connecting members connected to the stage, (iii) a pulley for supporting the connecting members, (iv) a motor for rotationally driving the pulley and for compensating for a weight of the stage, and (v) an anti-vibration mechanism for reducing vibration to be propagated from the connecting members to the stage.
A device manufacturing method, comprising the steps of:
- applying a photosensitive material to a wafer;
- exposing the wafer by use of an exposure apparatus;
- and
- developing the exposed wafer,
- wherein the exposure apparatus comprises (i) a stage movable along a reference plane, containing a vertical direction, and in the vertical direction or a direction close to the vertical direction, (ii) a countermass, balancing with a weight of the stage, (iii) connecting members for connecting the countermass to the stage, (iv) a pulley for supporting the connecting members, and (v) an actuator for adjusting one of a tension force of and an effective length of the connection members.
A stage mechanism, comprising:
- a first stage movable along a reference plane, containing a vertical direction, and in the vertical direction or in a first direction close to the vertical direction;
- a second stage movable in a second direction intersecting with the first direction and relative to said first stage;
- a first driving mechanism for moving said first stage in the first direction;
- a second driving mechanism for moving said second stage in the second direction;
- a countermass movable in the first direction;
- a third driving mechanism for moving said countermass in a direction opposite to the first direction;
- and
- compensating means for compensating for a weight of said first stage and said countermass, wherein said compensating means comprises a connecting mechanism for connecting said stage and said countermass, said connecting mechanism includes a pulley and a belt, and said pulley has a pulley diameter ratio substantially corresponding to an inverse of a mass ratio between said first stage and said countermass.
Dependencies are inferred from the claim text.