Fluorine-containing copolymer and composition for preparing low reflectance film

A process for producing a fluorine-containing copolymer, said copolymer comprising:

• 1-99 mol % of a first repeating unit represented by the chemical formula (1) or (2);
• and
• 99-1 mol % of a second repeating unit represented by the general formula -Q- where Q is a bivalent organic group,
• wherein said fluorine-containing copolymer has a number average molecular weight of from 1,000 to 1,000,000 determined in a gel permeation chromatography using polystyrene as a standard material thereof,
• said process comprising polymerizing 1-99 mol % octafluoropropene with 99-1 mol % of a compound selected from the group consisting of:
• a first compound that is a vinyl ether represented by the general formula CH2═CH(OR2) where R2 is hydrogen atom or a C1-C30 group that is an alkyl group, a cycloalkyl group, a fluoroalkyl group or a cyclofluoroalkyl group, said C1-C30 group optionally having a substituent that is a lower alkyl group, a cycloalkyl group, a lower fluoroalkyl group, a hydroxyl group, an organic silicon-containing group having a hydrolyzable group, an epoxy group or a β-ketoester group,
• a second that compound is an alkyl ether represented by the general formula CH2═CH(CH2OR2) where R2 is defined as above,
• a third compound that is a perfluoroalkyl vinyl ether represented by the general formula CF2═CF(ORf) where Rf is a perfluoroalkyl group, and
• a fourth compound that is a carboxylic acid vinyl ester represented by the general formula CH2═CH(O—COR3) where R3 is hydrogen atom or a C1-C30 group that is an alkyl group, a cycloalkyl group, a fluoroalkyl group or a cyclofluoroalkyl group, said C1-C30 group optionally having a substituent that is a lower alkyl group, a cycloalkyl group, a lower fluoroalkyl group, a hydroxyl group, an organic silicon-containing group having a hydrolyzable group, an epoxy group or a β-ketoester group.

A fluorine-containing copolymer which is prepared by a process comprising polymerizing 1-99 mol % of an octafluorocyclopentene with 99-1 mol % of a compound having a polymerizing double bond,

• wherein said fluorine-containing copolymer has a number average molecular weight of from 1,000 to 1,000,000 determined in a gel permeation chromatography using polystyrene as a standard material thereof,
• wherein said compound is selected from the group consisting of:
• a first compound that is a vinyl ether represented by the general formula CH2═CH(OR2) where R2 is hydrogen atom or a C1-C30 group that is an alkyl group, a cycloalkyl group, a fluoroalkyl group or a cyclofluoroalkyl group, said C1-C30 group optionally having a substituent that is a lower alkyl group, a cycloalkyl group, a lower fluoroalkyl group, a hydroxyl group, an organic silicon-containing group having a hydrolyzable group, an epoxy group or a β-ketoester group,
• a second compound that is an allyl ether represented by the general formula CH2═CH(CH2OR2) where R2 is defined as above,
• a third compound that is a perfluoroalkyl vinyl ether represented by the general formula CF2═CF(ORf) where Rf is a perfluoroalkyl group, and
• a fourth compound that is a carboxylic acid vinyl ester represented by the general formula CH2═CH(O—COR3) where R3 is hydrogen atom or a C1-C30 group that is an alkyl group, a cycloalkyl group, a fluoroalkyl group or a cyclofluoroalkyl group, said C1-C30 group optionally having a substituent that is a lower alkyl group, a cycloalkyl group, a lower fluoroalkyl group, a hydroxyl group, an organic silicon-containing group having a hydrolyzable group, an epoxy group or a β-ketoester group.

A composition for forming a lower reflectance film, said composition comprising as a film-forming component a fluorine-containing polymer comprising a repeating unit that is represented by the chemical formula (1) or (2),

• wherein said fluorine-containing polymer further comprises another repeating unit represented by the general formula -Q- where Q is a bivalent organic group selected from the group consisting of:
• a first group represented by the general formula —CH2—CH(OR2)— where R2 is hydrogen atom or a C1-C30 group that is an alkyl group, a cycloalkyl group, a fluoroalkyl group or a cyclofluoroalkyl group, said C1-C30 group optionally having a substituent that is a lower alkyl group, a cycloalkyl group, a lower fluoroalkyl group, a hydroxyl group, an organic silicon-containing group having a hydrolyzable group, an epoxy group or a β-ketoester group,
• a second group represented by the general formula —CH2—CH(CH2OR2)— where R2 is defined as above,
• a third group represented by the general formula —CF2CF(ORf)— where Rf is a perfluoroalkyl group, and
• a fourth group represented by the general formula —CH2—CH(O—COR3)— where R3 is hydrogen atom or a C1-C30 group that is an alkyl group, a cycloalkyl group, a fluoroalkyl group or a cyclofluoroalkyl group, said C1-C30 group optionally having a substituent that is a lower alkyl group, a cycloalkyl group, a lower fluoroalkyl group, a hydroxyl group, an organic silicon-containing group having a hydrolyzable group, an epoxy group or a β-ketoester group.

An article comprising:

• a substrate;
• and
• a low reflectance film covering said substrate, said low reflectance film being prepared by a process comprising applying a composition to said substrate, said composition comprising as a film-forming component a fluorine-containing polymer comprising a repeating unit that is represented by the chemical formula (1) or (2),
• wherein said fluorine-containing polymer further comprises another repeating unit represented by the general formula -Q- where Q is a bivalent organic group selected from the group consisting of:
• a first group represented by the general formula —CH2—CH(OR2)— where R2 is hydrogen atom or a C1-C30 group that is an alkyl group, a cycloalkyl group, a fluoroalkyl group or a cyclofluoroalkyl group, said C1-C30 group optionally having a substituent that is a lower alkyl group, a cycloalkyl group, a lower fluoroalkyl group, a hydroxyl group, an organic silicon-containing group having a hydrolyzable group, an epoxy group or a β-ketoester group,
• a second group represented by the general formula —CH2—CH(CH2OR2)— where R2 is defined as above,
• a third group represented by the general formula —CF2—CF(ORf)— where Rf is a perfluoroalkyl group, and
• a fourth group represented by the general formula —CH2—CH(O—COR3)— where R3 is hydrogen atom or a C1-C30 group that is an alkyl group, a cycloalkyl group, a fluoroalkyl group or a cyclofluoroalkyl group, said C1-C30 group optionally having a substituent that is a lower alkyl group, a cycloalkyl group, a lower fluoroalkyl group, a hydroxyl group, an organic silicon-containing group having a hydrolyzable group, an epoxy group or a β-ketoester group.