Cosmetic compositions containing multi-block ionizable polysiloxane/polyurethane and/or polyurea polycondensates in solution, and uses thereof

A composition comprising at least one solution or at least one organic solvent-in-water emulsion, wherein said at least one solution or at least one organic solvent-in-water emulsion comprises at least one multiblock polycondensate dissolved in an aqueous solvent, an organic solvent, or a mixture thereof, the chain of said at least one multiblock polycondensate comprising the repetition of at least one polysiloxane block and at least one second block, wherein said at least one second block is chosen from polyurethane and polyurea blocks, wherein said at least one second block comprises at least one ionizable group, wherein said at least one second block is chosen from at least one polyurethane and/or polyurea block of formula (II) below:

• wherein
• X2, which may be identical or different, is —O— or —NH—,
• R is a divalent radical wherein said divalent radical is an aromatic, aliphatic or cycloaliphatic radical,
• x is an interger ranging from 1 to 10, and
• B is chosen from radicals of formula (III):
• wherein
• R2 is a linear or branched C1-C3 alkyl radical,
• Z is a —COOH or —SO3H function or a salt of these acidic functions, and
• p and q, which may be identical or different, are integers ranging from 1 to 5, or formula (III′):
• wherein
• Z is a —COOH or —SO3H function or a salt of these acidic functions, and further wherein the composition is a cosmetic or dermatological composition, and wherein the composition contains at least one organic solvent which is immiscible in water.

A composition comprising at least one solution or at least one organic solvent-in-water emulsion, wherein said at least one solution or at least one organic solvent-in-water emulsion comprises at least one multiblock polycondensate dissolved in an aqueous solvent, an organic solvent, or a mixture thereof, the chain of said at least one multiblock polycondensate comprising the repetition of at least one polysiloxane block and at least one second block, wherein said at least one second block is chosen from polyurethane and polyurea blocks, wherein said at least one second block comprises at least one ionizable group, wherein said at least one second block is chosen from at least one polyurethane and/or polyurea block of formula (II) below:

• wherein
• X2, which may be identical or different, is —O— or —NH—,
• R is a divalent radical wherein said divalent radical is an aromatic, aliphatic or cycloaliphatic radical,
• x is an interger ranging from 1 to 10, and
• B is chosen from radicals of formula (III):
• wherein
• R2 is a linear or branched C1-C3 alkyl radical,
• Z is a —COOH or —SO3H function or a salt of these acidic functions, and
• p and q, which may be identical or different, are integers ranging from 1 to 5, or formula (III′):
• wherein
• Z is a —COOH or —SO3H function or a salt of these acidic functions, and further wherein the composition is a cosmetic or dermatological composition, wherein the composition contains at least one global solvent for the polycondensate and at least one additional solvent which is less polar than said global solvent, and wherein said at least one additional solvent dissolves the polysiloxane blocks of the polycondensate and has a slower rate of evaporation than said global solvent.

A composition comprising at least one solution or at least one organic solvent-in-water emulsion, wherein said at least one solution or at least one organic solvent-in-water emulsion comprises at least one multiblock polycondensate dissolved in an aqueous solvent, an organic solvent, or a mixture thereof, the chain of said at least one multiblock polycondensate comprising the repetition of at least one polysiloxane block and at least one second block, wherein said at least one second block is chosen from polyurethane and polyurea blocks, wherein said at least one second block comprises at least one ionizable group, wherein said at least one second block is chosen from at least one polyurethane and/or polyurea block of formula (II) below:

• wherein
• X2, which may be identical or different, is —O— or —NH—,
• R is a divalent radical wherein said divalent radical is an aromatic, aliphatic or cycloaliphatic radical,
• x is an interger ranging from 1 to 10, and
• B is chosen from radicals of formula (III):
• wherein
• R2 is a linear or branched C1-C3 alkyl radical,
• Z is a —COOH or —SO3H function or a salt of these acidic functions, and
• p and q, which may be identical or different, are integers ranging from 1 to 5, or formula (III′):
• wherein
• Z is a —COOH or —SO3H function or a salt of these acidic functions, and further wherein the composition is a cosmetic or dermatological composition, wherein the composition contains at least one global solvent for the polycondensate and at least one additional solvent which is less polar than said global solvent, and wherein said at least one additional solvent is selected from cyclic silicones and hydrocarbons.

A process for preparing a cosmetic composition, said process comprising adding at least one polycondensate solution or emulsion as a film-forming agent or as an additive for a film-forming agent, to the composition, wherein said at least one polycondensate solution or emulsion comprises at least one solution or at least one organic solvent-in-water emulsion, wherein said at least one solution or at least one organic solvent-in-water emulsion comprises at least one multiblock polycondensate dissolved in an aqueous solvent, an organic solvent, or a mixture thereof, the chain of said at least one multiblock polycondensate comprising the repetition of at least one polysiloxane block and at least one second block, wherein said at least one second block is chosen from polyurethane and polyurea blocks, wherein said at least one second block comprises at least one ionizable group, wherein said at least one second block is chosen from at least one polyurethane and/or polyurea block of formula (II) below:

• wherein
• X2, which may be identical or different, is —O— or —NH—,
• R is a divalent radical wherein said divalent radical is an aromatic, aliphatic or cycloaliphatic radical,
• x is an interger ranging from 1 to 10, and
• B is chosen from radicals of formula (III):
• wherein
• R2 is a linear or branched C1-C3 alkyl radical,
• Z is a —COOH or —SO3H function or a salt of these acidic functions, and
• p and q, which may be identical or different, are integers ranging from 1 to 5, or formula (III′):
• wherein
• Z is a —COOH or —SO3H function or a salt of these acidic functions, and further wherein the composition is a cosmetic or dermatological composition.