System for reclaiming process water
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorYi-Jang Hsieh
Life of this patent
Estimating the term…
Abstract
The present invention generally relates to a system and a method for reclaiming process water in a manufacturing plant and more particularly, relates to a system and a method for reclaiming process water from a cooling tower exhaust gas which contains at least 80% relative humidity by utilizing a heat exchanger equipped with cooling elements that are cooled by a flow of exhaust gas formed by a general exhaust and a scrubber exhaust from a semiconductor fabrication facility.
Claims10
A system for reclaiming process water from a cooling tower exhaust from a semiconductor fabrication plant comprising:
- a semiconductor fabrication plant,
- a source of general exhaust gas from rooms within said semiconductor fabrication plant,
- scrubber exhaust gas from semiconductor fabrication systems within said rooms of said semiconductor fabrication plant,
- a heat exchanger equipped with cooling elements, a gas inlet and a gas outlet,
- a flow of exhaust gas having a temperature not higher than 24° C. for passing through cavities in said cooling elements, wherein said flow of exhaust gas being composed of said general exhaust gas and said scrubber exhaust gas,
- a cooling tower for producing an effluent gas containing at least 80% relative humidity, a conduit for feeding said effluent gas to said gas inlet of said heat exchanger and for passing over said cooling elements and exiting through said gas outlet, and
- a water collecting means for collecting water condensed on said cooling elements.
Dependencies are inferred from the claim text.