Wafer processing apparatus, method of operating the same and wafer detecting system
AssigneeTokyo Electron Limited
InventorsKenichi Yamaga, Yuji Ono, Masahiro Miyashita, Osamu Tanigawa
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorsKenichi Yamaga, Yuji Ono, Masahiro Miyashita, Osamu Tanigawa
Estimating the term…
A closed-type cassette is mounted on a cassette stand disposed in a working region at a position corresponding to an opening formed in a wall separating the working region from a loading region. When the cassette is mounted on the cassette stand, a detecting device gives a signal to that effect to a controller. Then, the controller closes a valve to interrupt nitrogen gas supply into the loading region. A lid of the cassette is opened 20 to 30 sec after the interruption of nitrogen gas supply into the loading region and, then, nitrogen gas supply is resumed. The pressure difference between the loading region and the interior of the cassette is decreased by interrupting nitrogen gas supply into the loading region, so that the lid can be easily opened.
A wafer processing apparatus handling wafers from cassettes having a cassette body with an internal space maintainable at a pressure approximately equal to atmospheric pressure, with a transparent part made of a transparent material and with a cassette opening of the cassette body on one side of the cassette body, shelves formed on an inner wall of the cassette body, and a lid for hermetically closing the cassette opening of the cassette body, thereby hermetically sealing the cassette body, said processing apparatus comprising:
Dependencies are inferred from the claim text.