Exposure apparatus with an anti-vibration structure

An exposure apparatus for transferring a pattern formed on a mask onto a photosensitized substrate through a projection optical system, comprising:

• an illumination optical system having at least an optical member and a field stop that defines an illumination area on said mask;
• an exposure machine main portion, which has at least a base support member which includes said photosensitized substrate, a first support structure which includes said projection optical system, and a second support structure which includes said mask mounted on said first support structure;
• an illumination support structure, located on the floor, on which said illumination optical system is mounted, which is separated from said exposure machine main portion;
• and
• an actuating member capable of actuating said exposure machine main portion along an optical axis of said projection optical system.

An exposure apparatus for transferring a pattern formed on a mask onto a photosensitive substrate, comprising:

• an illumination optical system including at least an exposure illumination light source and condenser lens for illuminating said mask through said condenser lens with an illumination beam from said illumination light source;
• an exposure machine main portion including at least a reticle stage for mounting said mask and a stage for mounting said photosensitive substrate;
• first and second support structures, said illumination optical system mounted on said first support structure and said exposure machine main portion mounted on said second support structure, said first support structure being separate and not fixed to said second support structure;
• and
• a first sensor that detects a mutual position between said first support structure and said second support structure and outputs a signal regarding said mutual position.

A method of manufacturing an exposure apparatus for transferring a pattern formed on a mask onto a photosensitized substrate, comprising:

• providing an illumination optical system having at least an optical member, for illuminating said mask with an illumination beam from an illumination light source;
• providing an exposure machine main portion, located on a floor, which supports at least said mask and said photosensitized substrate, said exposure machine main portion connected to an actuating member capable of actuating said exposure machine main portion so as to suppress a displacement of said exposure machine main portion;
• and
• providing an illumination support structure, located on a floor, on which said illumination optical system is mounted, which is separated from said exposure machine main portion.

A method of manufacturing an exposure apparatus for transferring a pattern formed on a mask onto a photosensitized substrate through a projection optical system comprising:

• providing an illumination optical system having at least an optical member and a field stop that defines an illumination area on said mask;
• providing an exposure machine main portion, located on a floor, which has at least a base support member which includes said photosensitized substrate, a first support structure which includes said projection optical system, and a second support structure which includes said mask mounted on said first support structure;
• providing an illumination support structure, located on the floor, on which said illumination optical system is mounted, which is separated from said exposure machine main portion;
• and
• an actuating member capable of actuating said exposure machine main portion along an optical axis of said projection optical system.

A method of manufacturing an exposure apparatus for transferring a pattern formed on a mask onto a photosensitized substrate through a projection optical system comprising:

• providing an illumination optical system having at least an exposure illumination light source and a condenser lens, for illumination said mask through said condenser lens with an illumination beam from said illumination light source;
• providing an exposure machine main portion including at least a reticle stage for mounting said mask and a stage for mounting said photosensitized substrate;
• providing a first and second support structure, said illumination optical system mounted on said first support structure and said exposure machine main portion mounted on said second support structure, said first support structure being separate and not fixed to said second support structure;
• and
• providing a first sensor that detects a mutual position between said first support structure and said second support structure and outputs a signal regarding said mutual position.

A method of manufacturing an exposure apparatus which has an illumination source which emits an illumination beam and a projection system which transfers a pattern formed on a mask onto a substrate, comprising:

• providing an illumination system, disposed between said mask and said illumination source, which illuminates said mask with said illumination beam;
• providing an exposure machine main portion which supports at least one of said mask, said substrate and said projection system;
• providing an actuating member capable of suppressing a motion of said exposure machine main portion, at least part of said actuator member being on said exposure machine main portion;
• and
• providing an illumination support structure on which said illumination system is mounted, which is separated from said exposure machine main portion.

A method of manufacturing an exposure apparatus which has an illumination source which emits an illumination beam and a projection system which transfers a pattern formed on a mask onto a substrate, comprising:

• providing an illumination optical system that includes at least a condenser lens, which illuminates said mask through said condenser lens with said illumination beam;
• providing an exposure machine main portion which includes at least one of said mask, said substrate and said projection optical system, said exposure machine main portion being located on an isolator;
• and
• providing an illumination support structure on which said illumination optical system is mounted, which is separated from said exposure machine main portion by said isolator.

A method for manufacturing an exposure apparatus which has an illumination source which emits an illumination beam and a projection system which transfers a pattern formed on a mask onto a substrate, comprising:

• providing an illumination system, disposed between said illumination source and said mask, which illuminates said mask with said illumination beam;
• providing an exposure machine main portion which supports at least one of said mask, said substrate and said projection system, said exposure machine main portion using a step-and-scan projection technique;
• and
• providing an illumination support structure on which said illumination system is mounted, which is separated from said exposure machine main portion.

An exposure apparatus which transfers a pattern of a mask onto an object, comprising:

• an illumination system which illuminates said mask with an exposure beam, said illumination system having a first illumination portion and a second illumination portion;
• an exposure device which transfers said pattern onto said object by a step-and-scan technique;
• a first support structure which supports said exposure device and either said first illumination portion or said second illumination portion;
• and
• a second support structure which supports the other of said first illumination portion and said second illumination portion, said second structure being separated from said first support structure.