Insulative film for thin film structures
AssigneePlanar Systems, Inc.
InventorsRunar Törnqvist, Tuomas Pitkänen
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Abstract
The present invention concerns an insulating film of a thin film structure deposited on an essentially alkali metal-free glass substrate, comprising alternating layers of aluminium oxide and titanium oxide and thin film electriluminescent device wherein said insulating film is incorporated as an insulating layer between the phosphor layer and the electrode layers. In the insulating film, the ratio between the cumulative thicknesses of said titanium oxide and said aluminium oxide is less than 0.75, and due to the ratio lower than that of prior art, good resistance against cracking of the film is obtained.
Claims19
An insulating film of a thin film structure deposited on an essentially alkali metal-free glass substrate, comprising a first buffer layer, a composite layer comprising alternating layers of aluminium oxide and titanium oxide, the ratio between the cumulative thicknesses of said titanium oxide and said aluminium oxide layers being less than 0.75, and a second buffer layer provided on top of the composite layer, said buffer layers having a significantly lower Ti-to Al-ratio than the composite layer.
Thin Film Electroluminescent display device, comprising
- a substrate consisting of an essentially alkali metal-free substrate;
- a first electrode layer provided on the substrate;
- a second electrode layer spaced apart from the first electrode layer;
- at least one phosphor layer fitted between the electrodes;
- and
- at least one dielectric layer provided on each side of each phosphor layer between the phosphor layer and the electrodes,
- at least one of said dielectric layers being constituted by alternating layers of aluminium oxide and titanium oxide, the ratio between the cumulative thicknesses of said titanium oxide and said aluminium oxide layers being less than 0.75.
Dependencies are inferred from the claim text.