Vacuum system with mist prevention apparatus for manufacturing semiconductor devices and method using the same

A vacuum system for use in manufacturing semiconductor devices, comprising:

• a load-lock chamber having an inner wall, and an opening to the outside;
• a door disposed over said opening and being openable and closable to open and close the interior of the load-lock chamber to the outside;
• a shutter leading to a processing chamber in which semiconductor wafers are processed;
• at least one vacuum pump connected to said load-lock chamber to create a vacuum in the load-lock chamber;
• a vent gas supply apparatus, connected to said load-lock chamber, for supplying a vent gas into said load-lock chamber in preparation for the opening of said door;
• a first heating element integrated with said vent gas supply apparatus;
• a second heating element disposed on the inner wall of said load-lock chamber;
• and
• a controller operatively connected to said first and second heating elements so as to operate said first heating element to pre-heat the vent gas before the vent gas enters said load-lock chamber, and so as to operate said second heating element to regulate the temperature in said load-lock chamber after wafers are processed in the processing chamber to maintain a temperature of the wafers once the wafers are located back in said load-lock chamber after having been processed.