Toroidal low-field reactive gas source
AssigneeApplied Science and Technology, Inc.
InventorsDonald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
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AssigneeApplied Science and Technology, Inc.
InventorsDonald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
Estimating the term…
An improved toroidal low-field plasma source allows plasma ignition within a wider range of gas conditions than permitted by prior art plasma sources. Power efficiency of the plasma source is improved by automatically adjusting the power delivered to the plasma based on the load to the power supply. The plasma source can be operated over a wider pressure range than allowed by prior art plasma sources. The plasma source can be operated so as to increase the output of atomic species from the source. The plasma source can be operated to increase the etch rate of organic materials. The plasma source can efficiently remove hazardous gas compounds from effluent gas streams by converting them into scrubbable products.
An apparatus for dissociating gases in a plasma comprising:
A method for dissociating gases in a plasma and controlling plasma ignition, the method comprising:
An apparatus for dissociating gases into a plasma, comprising:
A method for dissociating gases in a plasma and controlling plasma ignition, the method comprising:
An apparatus for dissociating gases in a plasma comprising:
A method for dissociating gases in a plasma and controlling power of plasma sources, the method comprising:
An apparatus for dissociating gases in a plasma comprising
A method for dissociating gases in a plasma and controlling a constant current in the plasma, the method comprising:
An apparatus for dissociating gases in a plasma comprising:
A method for dissociating gases in a plasma and controlling power of plasma sources, the method comprising:
An apparatus for dissociating gases comprising:
A method for reducing the electric field required to operate a toroidal plasma source, the method comprising:
A method for dissociating gases into a plasma comprising:
A method processing materials with a reactive gas generated by a plasma source, the method comprising:
Dependencies are inferred from the claim text.