US 6,388,020 B2 · Structural isomers of poly (alkyl ethylenes)

Abstract

Structurally isomeric poly(alkyl ethylenes) with H and Y structures, polymeric bridging segments and a Y index of 2×10−3 to 8×10−3 (kJ/mole/degree), have decreased instability in the melt and more advantageous processing properties. The structurally isomeric poly(alkyl ethylenes) with H and Y structures are synthesized by an irradiating method, a melt reaction method or a solid phase reaction method by reacting poly(alkyl ethylenes) with 0.05 to 5% by weight of monofunctional, difunctional and polyfunctional monomers, optionally in the presence of peroxides. The structurally isomeric poly(alkyl ethylenes) are suitable for producing films, sheets, panels, coatings, pipes, hollow objects and foams.

Claims5

Dependent claims

A method of synthesizing structurally isomeric poly(alkyl ethylenes) comprising:

irradiating a mixture of poly(C1 to C4-alkyl ethylenes) and 0.02 to 5% by weight of at least one monomer selected from the group consisting of acrylic acid, C4 to C12 acrylic acid derivatives, allyl compounds, diacrylates, diallyl compounds, dienes, dimethacrylates, divinyl compounds, monovinyl compounds, polyacrylates, polymethacrylates and triallyl compounds in a fluidized bed at 333° to 448° K.;
the radiation being ionizing radiation having an energy of 150 to 10,000 KeV at a radiation dose of 0.5 to 80% KGy;
and
thermally treating the irradiated mixture at 380° to 550° K.

1 more element

A method of synthesizing structurally isomeric poly(alkyl ethylenes) comprising:

in a first step, in an extruder reacting a mixture of molten poly(C1 to C4-alkyl ethylenes) and 0.01 to 3% by weight of at least one radical forming agent selected from the group consisting of acyl peroxides, alkyl peroxides, hydroperoxides and peresters;
and
a second step of feeding into the extruder and reacting with the molten reaction product of the first step at temperatures in the range of 140 to 320° C. 0.01 to 5% by weight of a mixture of at least one monomer selected from the group consisting of acrylic acid, C4 to C12 acrylic acid derivatives, allyl compounds, diacrylates, diallyl compounds, dienes, dimethacrylates, divinyl compounds, monovinyl compounds other than vinyl imidazole, polyacrylates, polymethacrylates and triallyl compounds, and 0.001 to 3.0% by weight of at least one radical forming agent selected from the group consisting of acyl peroxides, alkyl peroxides, hydroperoxides and peresters.

Dependencies are inferred from the claim text.

Structural isomers of poly (alkyl ethylenes)

Life of this patent

Structural isomers of poly (alkyl ethylenes)

Life of this patent

Abstract

Claims5