Method of crystallizing a silicon film and thin film transistor and fabricating method thereof using the same

Abstract

The present invention relates to a method of crystallizing a silicon film, a thin film transistor, and a fabricating method thereof using the same. More particularly, the present invention relates forming a crystalline silicon film by crystallizing a silicon film using laser energy, and a thin film transistor and a fabricating method thereof using the same. The present invention includes forming a buffer layer on a substrate and forming an amorphous silicon film on the buffer layer wherein the amorphous silicon film includes a first region and second regions connected to both ends of the first region. The buffer layer is etched to a degree by using the amorphous silicon as a mask, wherein a space is formed under the first region and a central part of the second region contacts a remaining portion of the buffer layer. The amorphous silicon film is then crystallized. In another aspect, the present invention includes a method of fabricating a thin film transistor using this method of crystallizing an amorphous silicon film.

Dependencies are inferred from the claim text.