Processing method of thermally developable photosensitive material
AssigneeKonica Corporation
InventorTakeshi Sampei
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Abstract
A processing method which thermally develops a thermally developable photosensitive material which is exposed imagewise, comprising the step of thermally developing said thermally developable photosensitive material using heating element which intermittently heats and has duration time of surface temperature of not less than 250° C. to be not more than 1 second, wherein said thermally developable photosensitive material comprising a support having thereon one layer or plural layers; containing organic silver salt, photosensitive silver halide grains and a reducing agent.
Claims10
A processing method for developing a thermally developable photosensitive material which is imagewise exposed to 600 to 800 nm semiconductor light, said method comprising thermally developing said thermally developable photosensitive material by a heating element which intermittently heats at a surface temperature from 250° C. to 500° C. and a duration time between 0.01 and 10 milliseconds, wherein said thermally developable photosensitive material comprising a support having thereon at least one layer containing an organic silver salt, photosensitive silver halide grains and a reducing agent.
A processing method for developing a thermally developable photosensitive material which is imagewise exposed, said method comprising thermally developing said thermally developable photosensitive material by a thermal head which intermittently heats at surface temperature 250° C. to 500° C. and a duration time between 0.01 and 10 milliseconds, wherein said thermally developable photosensitive material comprising a support having thereon one layer containing an organic silver salt, photosensitive silver halide grains and a reducing agent.
Dependencies are inferred from the claim text.