Diamond-coated hard metal member
AssigneeNgk Spark Plug Co., Ltd.
InventorsTakashi Okamura, Satoshi Iio, Hiromi Saguchi
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Abstract
A diamond-coated hard metal member comprising a WC-based hard metal substrate having a roughened surface formed by electrolytic etching and a diamond coat layer coating the roughened surface with an interlayer provided interposed therebetween. The interlayer coats the substrate, and is a W layer having a roughened surface corresponding to the roughened surface of the substrate. The unetched substrate comprises disperse phases dispersed therein in an amount of from 2 to 5 mol-%, and has disperse phases having an average longest diameter of from not less than 0.5 μm to less than 2 μm on the surface thereof in a density of from not less than 0.1/μm2 to not more than 0.2/μm2.
Claims9
A diamond-coated hard metal member, comprising:
- a hard metal substrate having a roughened surface;
- and
- a diamond coat layer coating the roughened surface of said substrate, either directly or with an interlayer containing a metal or metal compound interposed therebetween;
- wherein said substrate has fine projections having an average diameter of not more than 3.2 μm at the base thereof in a density of not less than 0.12/μm2, and said diamond coat layer or interlayer that directly coats said substrate has a roughened surface corresponding to the roughened surface of said substrate.
A diamond-coated hard metal member, comprising:
- a hard metal substrate having a roughened surface;
- and
- a diamond coat layer coating the roughened surface of said substrate, either directly or with an interlayer containing a metal or metal compound interposed therebetween;
- wherein the roughened surface of said substrate is obtained by electrolytically etching a WC-based hard metal substrate comprising WC as a main component, said substrate contains an unetched portion having a metal element or metal compound and comprises a disperse phase having a sufficiently lower electrolytic etching rate than the WC dispersed therein in a surface region to at least a thickness that can be electrolytically etched in an amount of from 2 to 5 mol-%, and the surface of said unetched substrate has small diameter disperse phases having an average diameter of from not less than 0.5 μm to less than 2 μm in a density of from not less than 0.1/μm2 to not more than 0.2/μm2 or large diameter disperse phases having an average diameter of from not less than 2 μm to not more than 3 μm in a density of from not less than 0.03/μm2 to not more than 0.1/μm2, and said diamond coat layer or interlayer that directly coats said substrate has a roughened surface corresponding to the roughened surface of said substrate.
A process for producing a diamond-coated member, comprising the steps of:
- forming a hard metal substrate containing a disperse phase having a lower electrolytic etching rate than WC dispersed in the substrate;
- electrolytically etching the hard metal substrate to form fine projections having an average diameter of not more than 3.2 μm at the base thereof in a density of not less than 0.12/μm2;
- and
- forming a diamond coat layer on the surface of the electrolytically etched hard metal substrate, either directly or with an interlayer containing a metal or metal compound interposed therebetween, wherein the diamond coat layer or interlayer that directly coats the substrate has a roughened surface corresponding to the roughened surface of the substrate.
A process for producing a diamond-coating member, comprising the steps of:
- forming a hard metal substrate containing a disperse phase having a lower electrolytic etching rate than WC dispersed therein in a surface region to at least a thickness that can be electrolytically etched in an amount of from 2 to 5 mol-%, wherein the surface of the substrate has small diameter disperse phases having an average diameter of from not less than 0.5 μm to less than 2 μm in a density of from not less than 0.1/μm2 to not more than 0.2/μm2 or large diameter disperse phases having an average diameter of from not less than 2 μm to not more than 3 μm in a density of from not less than 0.03/μm2 to not more than 0.1/μm2;
- electrolytically etching the substrate to form a roughened surface thereon;
- and
- forming a diamond coat layer on the roughened surface of the substrate, either directly or with an interlayer containing a metal or metal compound interposed therebetween, wherein the diamond coat layer or interlayer that directly coats the substrate has a roughened surface corresponding to the roughened surface of the substrate.
Dependencies are inferred from the claim text.