Method of manufacturing thin-film magnetic head

A method of manufacturing a thin-film magnetic head comprising:

• a magnetoresistive element;
• a first shield layer and a second shield layer for shielding the magnetoresistive element, the first shield layer and the second shield layer facing each other with the magnetoresistive element in between;
• a first insulating layer provided between the magnetoresistive element and the first shield layer and a second insulating layer provided between the magnetoresistive element and the second shield layer;
• and an electrode connected to the magnetoresistive element;
• one of the first and second shield layers having a groove in which at least part of the electrode is placed;
• the at least part of the electrode being insulated and placed in the groove;
• the method including the steps of:
• forming the first shield layer;
• forming the first insulating layer on the first shield layer;
• forming the magnetoresistive element on the first insulating layer;
• forming the second insulating layer on the magnetoresistive element and the first insulating layer;
• forming the second shield layer on the second insulating layer;
• and
• forming the electrode connected to the magnetoresistive element;
• wherein:
• in the step of forming the electrode and the step of forming one of the shield layers, the electrode and the one of the shield layers are formed by forming the at least part of the electrode, and forming the one of the shield layers to surround the at least part of the electrode, an insulating film being placed between the at least part of the electrode and the one of the shield layers.