On-chip single layer horizontal deflecting waveguide and damascene method of fabricating the same
AssigneeLSI Logic Corporation
InventorsVerne C. Hornbeck, Derryl D. J. Allman
Life of this patent
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Abstract
A horizontal deflecting optical waveguide is formed in an integrated circuit-like structure having a substrate and at least one layer of dielectric material above the substrate. A trench is formed in the dielectric material, and the trench has first and second portions angularly joined at a bent portion. A reflective layer of material adjoins, conforms to and extends along the side walls of the trench. A core of optically transmissive material conforms to the reflective layer within the trench. The reflective layer forms a wall at the bent portion which reflects light from the core located in one portion into the core located in the other portion.
Claims8
A method of fabricating a horizontal deflecting optical waveguide in interlayer dielectric material located above a substrate of an integrated circuit-like structure, comprising the steps of:
- forming a trench in the dielectric material, the trench having first and second portions joined at a bent portion where the first and second portions extend in an angular relation with respect to one another;
- forming the trench to include a reflection wall extending at an angle with respect to the first and second portions;
- forming a reflective layer of material in the trench and on the wall;
- and
- forming a core of optically transmissive material within the trench and interior of the reflective layer.
Dependencies are inferred from the claim text.