Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry
AssigneeShowa Denko K.K.
InventorsTakanori Kido, Masayuki Sanbayashi, Fumio Tsujino, Kagetaka Ichikawa
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Abstract
A cerium oxide slurry for polishing comprising cerium oxide dispersed in water, wherein the slurry has a conductivity of about 30c μS/cm or less when the cerium oxide concentration in the slurry is c wt. %. In order to adjust the conductivity to about 30c μS/cm or less, cerium oxide is washed with deionized water.
Claims4
A process for producing a cerium oxide slurry for polishing, said slurry comprising cerium oxide dispersed in water, which process comprises the steps of washing cerium oxide with deionized water, and dispersing the thus-washed cerium oxide in water to form a slurry, thereby controlling the conductivity of the slurry to about 30c μS/cm or less when the concentration of cerium oxide in the slurry is c wt. %.
A process for producing a cerium oxide slurry for polishing, said slurry comprising cerium oxide dispersed in water, which process comprises the steps of washing cerium oxide with deionized water, drying the washed product with heat, and dispersing the thus-washed cerium oxide in water to form a slurry, thereby controlling the conductivity of the slurry to about 30c μS/cm or less when the concentration of cerium oxide in the slurry is c wt. %.
Dependencies are inferred from the claim text.