Conditioning disk for conditioning a polishing pad
AssigneeApplied Materials, Inc.
InventorsSuzuki Kenji, Raijiro Koga
Life of this patent
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Abstract
The present invention generally provides an apparatus and a method for conditioning a polishing pad in a polishing system. In one embodiment, the apparatus includes a conditioning disk having conditioning elements disposed on the bottom surface and away from the center portion of the disk. In another embodiment, the apparatus includes a base plate and a ring-shaped plate in which the conditioning elements are disposed on the ring-shaped plate. In still another embodiment, the apparatus includes a conditioning disk having conditioning elements disposed on the bottom surface and away from the center portion of the disk and having brush bristles disposed on the center portion of the disk.
Claims20
An apparatus for conditioning a polishing surface of a polishing pad, comprising:
- a disk comprising a base plate and a conditioning plate releasably attached thereto by at least one magnet;
- and
- conditioning elements disposed on a bottom surface of the conditioning plate and away from a center portion of the conditioning plate.
An apparatus for conditioning a polishing surface of a polishing pad, comprising:
- a disk having a bottom surface and a center portion;
- conditioning elements disposed on the bottom surface of the disk and away from the center portion of the disk;
- and
- brush bristles disposed at the center portion of the disk and on the bottom surface of the disk.
An apparatus for conditioning a polishing surface of a polishing pad, comprising:
- a disk comprising a base plate and a ring-shaped plate attached thereto;
- conditioning elements disposed in an annular shape on the ring-shaped plate;
- and
- brush bristles disposed through a hole of the ring-shaped plate.
Dependencies are inferred from the claim text.