Cleaning apparatus
AssigneeDisco Corporation
InventorsNaritoshi Ozawa, Xiaoming Qiu, Satoshi Ohkawara
Life of this patent
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Abstract
A cleaning apparatus includes a nozzle having an ejection port, a cleaning liquid path communicating with the ejection port, and a compressed gas path communicating with the ejection port. The cleaning apparatus further includes a cleaning liquid feeding component for feeding a cleaning liquid to the cleaning liquid path, and a compressed gas feeding component for feeding a compressed gas to the compressed gas path. The compressed gas is ejected from the ejection port through the compressed gas path, while the cleaning liquid is ejected from the ejection port through the cleaning liquid path.
Claims7
A cleaning apparatus comprising:
- nozzle means having an ejection port, a cleaning liquid path communicating with the ejection port, and a compressed gas path communicating with the ejection port, wherein a constriction is formed in a downstream end portion of the compressed gas path and the cleaning liquid path is caused to communicate with the compressed gas path between the constriction and the ejection port, or at the constriction, and is also caused to communicate with the ejection port via the downstream end portion of the compressed gas path;
- cleaning liquid feeding means for feeding a cleaning liquid to the cleaning liquid path, wherein the cleaning liquid feeding means feeds the cleaning liquid to the cleaning liquid path at a pressure of 1.5 to 2.5 kgfcm2;
- and
- compressed gas feeding means for feeding a compressed gas to the compressed gas path, wherein the compressed gas feeding means feeds the compressed gas to the compressed gas path at a pressure of 2.7 kgfcm2 or higher, and wherein
- the compressed gas is ejected from the ejection port through the compressed gas path, while the cleaning liquid is ejected from the ejection port through the cleaning liquid path.
Dependencies are inferred from the claim text.