Scrubbing apparatus

A scrubbing apparatus for cleaning a surface of a substrate or a surface of a film on a substrate, comprising:

• a substance support section for supporting a substrate horizontally and substantially in contact with a circumferential portion of the substrate while front side and back side surfaces of the substrate are substantially kept untouched in operation by the substance;
• a rotation drive device for driving the substrate support section to rotate in order to give a rotation force to the substrate;
• a brush member for scrub-cleaning the substrate while contacting at least said front side surface;
• a liquid source for supplying a cleaning liquid;
• a first supply circuit communicated with the liquid source;
• a main nozzle, having a discharge port for discharging the cleaning liquid through the first supply circuit, and an annular recess provided near the discharge port to surround a part of the first supply circuit, for supplying the cleaning liquid in at least a central region of the substrate;
• a second supply circuit communicated with the liquid source;
• an auxiliary nozzle, having a discharge port for discharging the cleaning liquid through the second supply circuit, and an annular recess provided near the discharge port to surround a part of the second supply circuit, for supplying the cleaning liquid in at least a peripheral region of the substrate;
• a first ultrasonic oscillator provided in the annular recess of the main nozzle, for applying ultrasonic waves to the cleaning liquid passing through the first supply circuit;
• a second ultrasonic oscillator provided in the annular recess of the auxiliary nozzle, for applying ultrasonic waves to the cleaning liquid passing through the second supply circuit;
• a power supply for supplying a power to the first and second ultrasonic oscillators;
• a control device for controlling the second ultrasonic oscillator so that the ultrasonic waves are applied to the cleaning liquid supplied from the auxiliary nozzle to the peripheral region of the substrate, and controlling the power outputted from the power supply to the first and second ultrasonic oscillators so that a cleaning power for the peripheral region of the substrate by the auxiliary nozzle is higher than that for the central portion of the substrate by the main nozzle,
• wherein the control device includes a mechanism configured to control the main nozzle and the auxiliary nozzle so as to operate simultaneously.