Coating film forming apparatus and coating film forming method

A coating film forming apparatus comprising:

• a substrate holding section for holding a substrate;
• a supply nozzle, which is disposed to be opposite to the substrate held by the substrate holding section, for discharging treatment solution to the corresponding substrate;
• a treatment solution supply control section for controlling discharge of the treatment solution from the supply nozzle;
• an X-direction driving mechanism for moving the supply nozzle in an X direction;
• a Y-direction driving mechanism for relatively moving the substrate holding section and the supply nozzle intermittently in a Y direction;
• a parameter setting section for partially designating parameters values, which are processing conditions for applying the coating of treatment solution to the substrate by the supply nozzle, to set a residual parameter value;
• and
• processing means for generating a control signal for controlling the supply control section, X-direction driving mechanism, and Y-direction driving condition based on th e parameter value set by the parameter setting section,
• wherein the corresponding supply nozzle is moved in the X direction as discharging the treatment solution from the supply nozzle in a state that the substrate holding section is stopped, and then the substrate holding section and the supply nozzle are relatively moved in the Y direction, and this operation is repeated, whereby applying the treatment solution to an entire surface of a coating film forming area of the substrate.

A coating film forming apparatus comprising:

• a substrate holding section for holding a substrate;
• a supply nozzle, which is disposed to be opposite to the substrate held by the substrate holding section, for discharging treatment solution to the corresponding substrate;
• a treatment solution supply control section for controlling discharge of the treatment solution from the supply nozzle;
• an X-direction driving mechanism for moving the supply nozzle in an X direction;
• a Y-direction driving mechanism for relatively moving the substrate holding section and the supply nozzle intermittently in a Y direction;
• a parameter setting section for setting parameter values, which are processing conditions for applying the coating of treatment solution to the substrate by the supply nozzle, to correct the parameter values based on a measured film thickness, which is actually obtained by the set parameter values, and a target film thickness;
• and
• processing means for generating a control signal for controlling the supply control section, X-direction driving mechanism, and Y-direction driving condition based on the parameter value set by the parameter setting section,
• wherein the corresponding supply nozzle is moved in the X direction as discharging the treatment solution from the supply nozzle in a state that the substrate holding section is stopped, and then the substrate holding section and the supply nozzle are relatively moved in the Y direction, and this operation is repeated, whereby applying the treatment solution to an entire surface of a coating film forming area of the substrate.

A coating film forming apparatus comprising:

• a substrate holding section for holding a substrate;
• a supply nozzle for supplying treatment solution to a surface of the substrate held by the substrate holding section;
• a driving mechanism for relatively driving the substrate holding section and the supply nozzle along a substrate surface direction;
• and
• a control section for controlling an operation of the driving mechanism;
• wherein the control section controls the operation of the driving mechanism and the supply nozzle such that an area that the processing solution is coated is divided into a plurality of regions and coating start positions of adjacent divided regions are not next to each other, whereby forming a liquid film of the treatment solution for each divided region of the substrate surface.

A coating film forming apparatus comprising:

• a substrate holding section for holding a substrate;
• a supply nozzle for supplying treatment solution to a surface of the substrate held by the substrate holding section;
• a driving mechanism for relatively driving the substrate holding section and the supply nozzle along a substrate surface direction;
• and
• a control section for controlling an operation of the driving mechanism;
• wherein the control section controls the operation of the driving mechanism and the supply nozzle such that no continuous coating is performed in order of a coating end position and a coating start position in a case when an area that the processing solution is coated is divided into a plurality of regions and the coating end position of one region of adjacent divided regions and the coating start position of the other region are next to each other, whereby forming a liquid film of the treatment solution for each divided region of the substrate surface.