US 6,383,896 B1 · Thin film forming method and thin film forming apparatus

Abstract

In a thin film forming method and an apparatus A for implementing the method, a deposition chamber 1 provided with a substrate holder 12 and a radical emitting device 2 continuing to the chamber 1 for emitting neutral radicals uniformly to a whole deposition target region of a deposition target substrate S held by the holder 12 are used. Deposition gas plasma PL1 is formed at the vicinity of the substrate S on the holder 12 by supplying a predetermined deposition gas into the chamber 1. Neutral radicals RA are produced by exciting and dissociating a predetermined radical material gas in the radical emitting device 2, and the radicals are uniformly emitted to the deposition target region of the substrate S for forming a predetermined thin film on the substrate S.

Claims21

Dependent claims

A thin film forming method for forming a predetermined thin film on a deposition target substrate, comprising the steps of:

preparing a deposition chamber provided with a substrate holder, and a radical emitting device continuing to said deposition chamber for emitting neutral radicals uniformly to a whole deposition target region of the deposition target substrate held by said substrate holder;
arranging the deposition target substrate on said substrate holder;
forming deposition gas plasma at the vicinity of the deposition target substrate arranged on said substrate holder by supplying a predetermined deposition gas into said deposition chamber;
and
producing neutral radicals by exciting and dissociating a predetermined radical material gas in said radical emitting device, and uniformly emitting the radicals to the deposition target region of said deposition target substrate.

2 more elements

A thin film forming apparatus comprising:

a deposition chamber;
a radical emitting device continuing to said deposition chamber;
a substrate holder arranged in said deposition chamber;
and
a deposition gas plasma producing device for forming plasma of a predetermined deposition gas at the vicinity of a deposition target substrate arranged on said substrate holder, wherein
said radical emitting device is opposed to a whole deposition target region of the deposition target substrate arranged on said substrate holder, produces neutral radicals by exciting and dissociating a predetermined radical material gas, and emitting the radicals uniformly to the whole deposition target region of said substrate.

3 more elements

Dependencies are inferred from the claim text.

Thin film forming method and thin film forming apparatus

Life of this patent

Thin film forming method and thin film forming apparatus

Life of this patent

Abstract

Claims21