Resist stripping composition
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsKazuto Ikemoto, Kojiro Abe, Tetsuo Aoyama
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Abstract
A resist stripping composition contains 0.001 to 0.5% by weight of a fluorine compound, 50 to 99% by weight of an ether solvent and the balance being substantially water. With such a specific content range of the ether solvent, the resist stripping composition shows reduced corrosive properties when diluted with water in the rinsing step as well as shows complete removal of resist residues without causing corrosion of wiring materials and substrate materials.
Claims23
A resist stripping composition comprising 0.001 to 0.5% by weight of a fluorine compound, 0.01 to 30% by weight of a corrosion inhibitor, 50 to 99% by weight of an ether solvent and the balance being substantially water, the corrosion inhibitor being selected from the group consisting of quaternary ammonium salts, organic salts derived from a carboxyl-containing organic compound and a basic substance, phosphoric acid-based chelate compounds, carboxylic acid-based chelate compounds, amine-based chelate compounds, and oxime-based chelate compounds.
Dependencies are inferred from the claim text.