Process control with control signal derived from metrology of a repetitive critical dimension feature of a test structure on the work piece
AssigneeAdvanced Micro Devices, Inc.
InventorAnthony J. Toprac
Life of this patent
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Abstract
A method is provided for manufacturing, the method including processing a workpiece in a processing step, measuring a critical dimension of features formed on the workpiece using a test structure formed on the workpiece, the test structure including a plurality of the features, and forming an output signal corresponding to the critical dimension measurements. The method also includes feeding back a control signal based on the output signal to adjust the processing performed in the processing step if the output signal corresponding to the critical dimension measurements indicates a predetermined tolerance value has been exceeded.
Claims20
A method of manufacturing, the method comprising:
- processing a work piece in a processing step;
- measuring dimensions of a repetitive critical dimension feature of a test structure formed on the work piece to form a set of critical dimension measurements;
- forming an output signal corresponding to a statistical analysis of the set of critical dimension measurements;
- and
- feeding back a control signal based on the output signal to adjust the processing performed in the processing step if the output signal corresponding to the set of critical dimension measurements indicates a predetermined tolerance value has been exceeded.
A method of manufacturing, the method comprising:
- processing a work piece in a processing step, the processing step including forming a test structure on the work piece, the test structure including a repetitive feature representative of a critical dimension;
- measuring dimensions of the repetitive feature to form a set of critical dimension measurements;
- forming an output signal corresponding to a statistical analysis of the set of critical dimension measurements;
- feeding back a control signal based on the output signal to adjust the processing performed in the processing step if the output signal corresponding to the statistical analysis of the set of critical dimension measurements indicates a predetermined tolerance value has been exceeded.
A method of manufacturing, the method comprising:
- processing a workpiece in a processing step, the processing step including forming a test structure on the workpiece, the test structure including a plurality of lines, each of the lines formed to have a line width of a gate line of a transistor, and each of adjacent pairs of the lines formed to have a pitch between adjacent lines of a transistor array;
- measuring line widths of at least two of the plurality of the lines of the test structure;
- measuring pitches between at least two of the adjacent pairs of the lines of the test structure;
- forming an output signal corresponding to a statistical analysis of the line widths and pitches measurements;
- and
- feeding back a control signal based on the output signal to adjust the processing performed in the processing step if the output signal corresponding to the line widths and pitches measurements indicates a predetermined tolerance value has been exceeded.
Dependencies are inferred from the claim text.