Method of etching transparent solid material with laser beam
AssigneeDirector-General of Agency of Industrial Science and Technology
InventorsJun Wang, Hiroyuki Niino, Akira Yabe
Life of this patent
Estimating the term…
Abstract
A method of etching a surface of a transparent solid material with a laser beam, wherein the surface is irradiated with the laser beam having a fluence of 0.01-100 J/cm2/pulse while maintaining a fluid capable of absorbing the laser beam in contact with an opposite surface of the solid material.
Claims12
A method of etching a transparent solid material having opposing first and second surfaces, comprising irradiating said second surface with a pulsed laser beam having a fluence of 0.01-100 J/cm2/pulse while maintaining said first surface in contact with a fluid capable of absorbing the laser beam so that said first surface is etched with the laser beam incident upon said second surface, wherein said fluid is a liquid solution of a substance selected from the group consisting of pyrene, benzil, and rhodamine 6G.
Dependencies are inferred from the claim text.