Method of making an LCD or X-ray imaging device with first and second insulating layers

A method of making a liquid crystal display, the method comprising the steps of:

• providing a first substrate;
• providing a liquid crystal layer;
• forming an array of TFTs on the first substrate, each of the TFTs being in communication with address lines also on the first substrate;
• forming a first passivating insulating layer over the TFTs and address lines on the first substrate;
• forming an organic second insulating layer over the first passivating insulating layer, the second insulating layer being photo-imageable, including an acrylic, and having a dielectric constant value of less than or equal to about 4.0, said first and second insulating layers each being substantially transparent to visible wavelengths of light;
• photoimaging an array of contact holes in the first insulating layer using the second insulating layer as an etch mask and etching corresponding contact holes in the second insulating layer;
• and
• forming an array of pixel electrodes over the second insulating layer so that each of the pixel electrodes is in communication with a corresponding TFT through a corresponding one of the contact holes defined in the first and second insulating layers and the first insulating layer prevents the acrylic inclusive second insulating layer from directly contacting TFTs.

A method of making a TFT structure, the method comprising the steps of:

• providing a substrate;
• forming an array of semiconductor based TFTs on the substrate, wherein each of the TFTs is in communication with at least one address line;
• forming a first insulating layer on the substrate over top of the TFTs and address lines;
• forming an acrylic inclusive second organic insulating layer over top of the first insulating layer on at least the TFTs and address lines;
• providing the second insulating layer with a dielectric constant value of less than or equal to about 4.0;
• forming an array of vias or contact holes in the second insulating layer by photoimaging and forming corresponding vias or contact holes in the first insulating layer by etching using the second insulating layer as an etch mask;
• and
• forming an array of electrode members on the substrate so that each of the electrode members is in communication with a corresponding one of the TFTs through a corresponding one of the contact holes.