Method and apparatus for manufacturing a micromechanical device
AssigneeSurface Technology Systems Limited
InventorAndrew Duncan McQuarrie
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Abstract
In the manufacture of a micromechanical device, a substrate, having a mask thereon, is etched using a flourine-containing etchant gas or vapour in the absence of a plasma through an opening in the mask to a desired depth to form a trench having a side wall and a base in the substrate. A layer of protecting substance is deposited on the exposed surfaces of the substrate and mask, and the protecting substance is then selectively removed from the base. The base is then etched using the fluorine-containing etchant.
Claims13
A method of manufacturing a micromechanical device, comprising:
- (a) etching a substrate, having a mask thereon, using a flourine-containing etchant gas or vapour in the absence of a plasma through an opening in the mask to a desired depth to form a trench having a side wall and a base in the substrate;
- (b) depositing a layer of a protecting substance on the exposed surfaces of the substrate and mask;
- (c) selectively removing the protecting substance from the base;
- and
- (d) etching the base using a fluorine-containing etchant.
An apparatus for manufacturing a micromechanical device comprising:
- (a) means providing a flourine-containing etchant gas or vapour in the absence of a plasma for etching a substrate, having a mask thereon, to a desired depth;
- (b) means for depositing a layer of a protecting substance on the exposed surfaces of the substrate and mask;
- (c) means for selectively removing the protecting substance;
- and
- (d) means for providing the fluorine-containing etchant for etching the unprotected areas.
Dependencies are inferred from the claim text.