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US 6,350,560 B1Granted
Rinse composition
AssigneeShipley Company, L.L.C.
InventorJavad J. Sahbari
Life of this patent
Estimating the term…
Abstract
Disclosed are compositions and methods useful for the removing polymer stripping compositions from substrates without formations of undesirable precipitate in the rinse solution. The compositions of the present invention are particularly suitable for removing residues of stripping compositions used to remove polymer residues from plasma etch processes.
Claims10
A method for manufacturing an electronic device comprising:
- a) containing polymeric material disposed on a substrate with a fluoride-based stripping composition for a period of time sufficient to at least partially remove the polymeric material;
- and b) then contacting the substrate with a rinsing composition including water and two or more solvents, wherein at least one solvent is selected from (C2-C20)alkanediols, (C2-C20)alkanetriols, (C1-C6)alkyl ethers of (C2-C20)alkanediols, di(C1-C6)alkyl ethers of (C2-C20)alkanediols, (C1-C6)alkyl ethers of (C2-C20)alkanetriols or di(C1-C6)alkyl ethers of (C2-C20)alkanetriols.
A method of removing polymeric material from a substrate comprising the steps of:
- a) contacting polymeric material disposed on a substrate with a fluoride-based stripping composition for a period of time sufficient to at least partially remove the polymeric material;
- and b) then contacting the substrate with a rinsing composition including water and two or more solvents, wherein at least one solvent is selected from (C2-C20)alkanediols, (C2-C20)alkanetriols, (C1-C6)alkyl ethers of (C2-C20)alkanediols, di(C1-C6)alkyl ethers of (C2-C20)alkanediols, (C1-C6)alkyl ethers of (C2-C20)alkanetriols or di(C1-C6)alkyl ethers of (C2-C20)alkanetriols.
Dependencies are inferred from the claim text.