Scan type projection exposure apparatus and device manufacturing method using the same

Abstract

A scan type exposure apparatus includes a first movable stage on which a first object is to be placed, a second movable stage on which a second object is to be placed, a projection optical system for projecting a pattern of the first object onto the second object, and a scanning mechanism for scanningly moving the first and second movable stages in a timed relation with each other, relative to the projection optical system, while the pattern of the first object is projected by the projection optical system onto the second object, wherein data, corresponding to a change in exposure condition as measured beforehand and to be produced by moving at least one of the first and second movable stages, is stored and wherein scan exposure is performed while reflecting a correction value, as determined on the basis of the data stored, to the drive of at least one of the first and second movable stages.

Claims aren’t available for this document.