Method for manufacturing an LCD in which a photoresist layer is at least 1.2 times thicker than the passivation layer

Abstract

A method for manufacturing a liquid crystal display has a TFT functioning as a switching elements, a passivation layer covering the TFT and a pixel electrode connected to an output electrode of the TFT on the passivation layer. The method includes coating a photoresist on the passivation layer so that the photoresist has a thickness of more than about 1.2 times the passivation layer. The photoresist is patterned to have a predetermined shape, and the passivation layer is etched according to the patterned photoresist. The remaining photoresist is removed, and treating the surface of the passivation layer with O2 yields a SiO2 thin layer on the passivation layer. A pixel electrode is formed on the passivation layer by depositing and patterning an ITO layer.

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