System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features

Abstract

Method for utilizing halftoning structures to manipulate the relative magnitudes of diffraction orders to ultimately construct the desired projected-image. At the resolution limit of the mask maker, this is especially useful for converting strong shifted, no 0th diffraction order, equal line and space chromeless phase edges to weak phase shifters that have some 0th order. Halftoning creates an imbalance in the electric field between the shifted regions and therefore results in the introduction of the 0th diffraction order.

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