Charged beam mask having strut wider than charged beam, with shape that matches charged beam

Abstract

This invention provides a charged beam projection mask, a charged beam exposure apparatus, and the like which prevent variations in exposure dose and a positional error of a pattern projected on a wafer, thereby improving a pattern precision. In the charged beam mask, strut portions separating mask pattern regions constituting a stripe in one direction have a width larger than the width of a beam on the mask.

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