Method for producing ink-jet recording head

Abstract

In a method of making an ink jet recording head, oxide films are formed on both surfaces of a silicon substrate, followed by a first metal film, a piezoelectric film, and a second metal film. A positive resist is formed on the bottom of the substrate, and a first negative resist on the top over the second metal film. The substrate is exposed between two masks. The positive resist is developed first with an alkaline solvent, and then the negative resist is developed with an organic solvent. A second negative resist is formed on top of the substrate before the bottom is etched with the patterned positive resist. The second negative resist is removed afterward, and then the second metal film is etched using the patterned first negative resist.

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