Synthetic fused silica member
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsHisatoshi Otsuka, Kazuo Shirota, Kazuhiro Kumakura
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Abstract
There is disclosed a synthetic fused silica member used at a wavelength of 200 nm or less which has a hydroxyl group-content of 1 to 50 ppm and a fluorine-content of 100 to 1000 ppm, and contains no chlorine, and has a birefringence of the synthetic fused silica member of 2 nm/cm or less. The synthetic fused silica member can be used as a synthetic fused silica substrate for photomask, or in an optical system wherein a fluorine excimer laser is used as a light source. There can be provided a synthetic fused silica member which can efficiently transmit a light having a wavelength as 200 nm or less, especially fluorine excimer laser (157 nm), and does not suffer from lowering of transmittance due to damage.
Claims2
A synthetic fused silica substrate for photomask used at a wavelength of 200 nm or less which has a hydroxyl group-content of 1 to 50 ppm and a fluorine-content of 100 to 1000 ppm, contains no chlorine, and has birefringence of 2 nm/cm or less.
Dependencies are inferred from the claim text.