Method and apparatus for correcting defects in photomask
AssigneeNEC Corporation
InventorYukio Morishige
Life of this patent
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Abstract
Cr(CO)6 gas is fed into a chamber, in which a photomask substrate having any clear deflect resulting from partial loss of a light-shielding film to fill the inside of the chamber with a Cr(CO)6 gas atmosphere. By irradiating with a laser beam the clear defect of the photomask substrate in the Cr(CO)6 gas atmosphere, the Cr(CO)6 gas is decomposed to form a Cr film over the clear defect. Tetrakis dimethylamino titanium gas (TDMAT) is fed into the chamber to switch the atmosphere in the chamber to a TDMAT gas atmosphere. By irradiating with a laser beam the area of the photomask substrate, arranged in the TDMAT gas atmosphere, where the Cr film has been formed, the TDMAT gas is decomposed to form a TiN film, whose reflectance is smaller than that of the Cr film, over the Cr film.
Claims12
A method for correcting any defective part on the surface of a substrate by forming a light-shielding film, comprising the steps of:
- depositing a metallic first film so as to cover a defective part on a surface of a substrate, and
- depositing a second film, whose reflectance is smaller than that of said metallic first film, on said metallic first film so as to cover said metallic first film.
A method of correction of a photomask substrate having any clear defect resulting from the loss of part of a light-shielding film arranged in an input gas atmosphere by irradiating said clear defect with a laser beam to form a film over said clear defect by laser CVD, comprising the steps of:
- providing a first input gas atmosphere within a vessel in which a photomask substrate having any clear defect resulting from the loss of part of a light-shielding film is arranged by feeding a first input gas into the vessel;
- forming a metallic light-shielding film over said clear defect by irradiating with a laser beam said clear defect on said photomask substrate in the atmosphere of the first input gas to decompose said first input gas;
- feeding a second input gas into said vessel to switch the atmosphere in said vessel to a second input gas atmosphere;
- and
- forming an antireflective film, whose reflectance is smaller than that of said light-shielding film, over said light-shielding film by irradiating with a laser beam an area of said photomask substrate, arranged in the second input gas atmosphere, where said first film is formed, to decompose said second input gas.
Dependencies are inferred from the claim text.