Device and method for detecting and preventing arcing in RF plasma systems
AssigneeTokyo Electron Limited
InventorsWayne L. Johnson, Richard Parsons
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Abstract
A system and method for detecting and preventing arcing in plasma processing systems. Arcing is detected and characterized by measuring and analyzing electrical signals from a circuit coupled to the plasma. After characterization, the electrical signals can then be correlated with arcing events occurring during a processing run. Information can be obtained regarding location, severity, and frequency of arcing events. The system and method better diagnose the causes of arcing and provide improved protection against undesirable arcing, which can cause damage to the system and the workpiece.
Claims40
A plasma system comprising:
- (a) a chamber;
- (b) a plasma generation circuit having:
- (i) a power source;
- and
- (ii) a plasma coupling element receiving power from said power source and supplying said power to a plasma region within said chamber;
- (c) a convertor for obtaining a received signal from a circuit coupled to said plasma region;
- and
- (d) a processing unit for determining whether said received signal includes a component in a predetermined frequency band, in order to detect arcing.
A method for detecting arcing in a plasma system, the method comprising the steps of:
- producing a plasma region by applying power from a first power source to a plasma generation circuit including a first plasma coupling element;
- obtaining a received signal based on said power applied from said first power source;
- detecting arcing by determining whether said received signal includes components in a predetermined frequency band;
- and
- providing an indication when arcing is detected.
Dependencies are inferred from the claim text.