Tantalum sputtering target with fine grains and uniform texture and method of manufacture
AssigneeHoneywell International Inc.
InventorStephen P. Turner
Life of this patent
Estimating the term…
Abstract
A method for producing a tantalum sputtering component includes a minimum of three stages each of which include a deformation step followed by an inert atmosphere high-temperature anneal. Temperatures of each of the anneal steps can be different from one another. A tantalum sputtering component includes a mean grain size of less than about 100 microns and a uniform texture throughout the component thickness. The uniform texture can be predominately {111}<uvw>.
Claims6
A tantalum sputtering component comprising a mean grain size of less than about 100 microns and a uniform texture that is predominately {111}<uvw> throughout a thickness of the component.
A tantalum sputtering component comprising a mean grain size of less than about 50 microns and a uniform texture that is predominately {111}<uvw> throughout a thickness of the component.
Dependencies are inferred from the claim text.