Method and apparatus for modeling electromagnetic interactions in electrical circuit metalizations to simulate their electrical characteristics

A method for use in computer aided simulation apparatus to model metalization structures in electrical circuits comprising the steps of:

• generating charge and/or current distributions from a source of current distribution on a metalization structure;
• determining interactions between metalization structures based on underlying characteristics of said charge and/or current distributions that generated said interactions;
• obtaining the charge and/or current distributions that generated said interactions;
• decomposing said interactions into a number of long-range interactions and a number of short-range interactions;
• minimizing said number of long range interactions by decomposing inter metalization interaction in a prescribed manner by performing a variable interaction range meshing process on said long-range interactions;
• and
• generating, in accordance with prescribed criteria based on said obtained charge and/or current distributions and their prescribed relationships with said number of long-range interactions and said number of short-range interactions, electrical characteristics including at least impedance and admittance values of an overall physical metalization structure, for example, an inductor, interconnect or the like, to be fabricated.

A method for use in computer simulation apparatus to model metalization structures in electrical circuits comprising the steps of:

• partitioning said metalization structure to be fabricated into metalization sub units;
• generating charge and/or current distributions from a source of current distribution on a metalization structure to be fabricated;
• determining interactions between metalization structures based on underlying characteristics of said charge and/or current distributions that generated said interactions, said step of determining interactions determines interactions between said metalization sub units;
• obtaining the charge and/or current distributions that generated said interactions;
• decomposing said interactions into a number of long-range interactions and a number of short-range interactions;
• minimizing said number of long range interactions by decomposing inter metalization interaction in a prescribed manner by performing a variable interaction range meshing process on said long-range interactions of said metalization sub units;
• and
• generating, in accordance with prescribed criteria based on said obtained charge and/or current distributions and their prescribed relationships with said number of long-range interactions and said number of short-range interactions, electrical characteristics including at least impedance and admittance values of an overall physical metalization structure, for example, an inductor, interconnect or the like, to be fabricated.

Apparatus for use in computer aided simulation apparatus to model metalization structures in electrical circuits comprising:

• means for generating charge and/or current distributions from a source of current distribution on a metalization structure;
• means for determining interactions between metalization structures based on underlying characteristics of said charge and/or current distributions that generated said interactions;
• means for obtaining the charge and/or current distributions that generated said interactions;
• means for decomposing said interactions into a number of long-range interactions and a number of short-range interactions;
• and
• means for generating, in accordance with prescribed criteria based on said obtained charge and/or current distributions and their prescribed relationships with said number of long-range interactions and said number of short-range interactions, electrical characteristics including at least impedance and admittance values of an overall physical metalization structure, for example, an inductor, interconnect or the like, to be fabricated.

Apparatus for use in computer aided simulation apparatus to model metalization structures in electrical circuits comprising:

• means for generating charge and/or current distributions from a source of current distribution on a metalization structure;
• means for determining interactions between metalization structures based on underlying characteristics of said charge and/or current distributions that generated said interactions;
• means for obtaining the charge and/or current distributions that generated said interactions;
• means for decomposing said interactions into a number of long-range interactions and a number of short-range interactions;
• means for minimizing said number of long range interactions by decomposing inter metalization interaction in a prescribed manner by performing a variable interaction range meshing process on said long range interactions;
• and
• means for generating, in accordance with prescribed criteria based on said obtained charge and/or current distributions and their prescribed relationships with said number of long-range interactions and said number of short-range interactions, electrical characteristics including at least impedance and admittance values of an overall physical metalization structure, for example, an inductor, interconnect or the like, to be fabricated.

Apparatus for use in computer aided simulation apparatus to model metalization structures in electrical circuits comprising:

• means for partitioning said metalization structure to be fabricated into metalization sub units;
• means for generating charge and/or current distributions from a source of current distribution on a metalization structure to be fabricated;
• means for determining interactions between metalization structures based on underlying characteristics of said charge and/or current distributions that generated said interactions, said step of determining interactions determines interactions between said metalization sub units;
• means for obtaining the charge and/or current distributions that generated said interactions;
• means for decomposing said interactions into a number of long-range interactions and a number of short-range interactions;
• means for minimizing said number of long range interactions by decomposing inter metalization interaction in a prescribed manner by performing a variable interaction range meshing process on said long range interactions of said metalization sub units;
• and
• means for generating, in accordance with prescribed criteria based on said obtained charge and/or current distributions and their prescribed relationships with said number of long-range interactions and said number of short-range interactions, electrical characteristics including at least impedance and admittance values of an overall physical metalization structure, for example, an inductor, interconnect or the like, to be fabricated.

Apparatus for use in computer aided simulation apparatus to model metalization structures in electrical circuits comprising:

• a first generator to generate charge and/or current distributions from a source of current distribution on a metalization structure;
• a first determinator to determine interactions between metalization structures based on underlying characteristics of said charge and/or current distributions that generated said interactions;
• a detector to detect the charge and/or current distributions that generated said interactions;
• a decomposer to decompose said interactions into a number of long-range interactions and a number of short-range interactions;
• and
• a second generator to generate, in accordance with prescribed criteria based on said obtained charge and/or current distributions and their prescribed relationships with said number of long-range interactions and said number of short-range interactions, electrical characteristics including at least impedance and admittance values of an overall physical metalization structure, for example, an inductor, interconnect or the like, to be fabricated.

Apparatus for use in computer aided simulation apparatus to model metalization structures in electrical circuits comprising:

• a first generator to generate charge and/or current distributions from a source of current distribution on a metalization structure;
• a first determinator to determine interactions between metalization structures based on underlying characteristics of said charge and/or current distributions that generated said interactions;
• a detector to detect the charge and/or current distributions that generated said interactions;
• a decomposer to decompose said interactions into a number of long-range interactions and a number of short-range interactions;
• a minimizer to minimize the number of long-range interactions by decomposing inter metalization interactions in a prescribed manner by performing a variable interaction range meshing process on said long-range interactions;
• and
• a second generator to generate, in accordance with prescribed criteria based on said obtained charge and/or current distributions and their prescribed relationships with said number of long-range interactions and said number of short-range interactions, electrical characteristics including at least impedance and admittance values of an overall physical metalization structure, for example, an inductor, interconnect or the like, to be fabricated.

Apparatus for use in computer aided simulation apparatus to model metalization structures in electrical circuits comprising:

• a partitioner to partition said metalization structure to be fabricated into metalization sub units;
• a first generator to generate charge and/or current distributions from a source of current distribution on a metalization structure;
• a first determinator to determine interactions between metalization structures based on underlying characteristics of said charge and/or current distributions that generated said interactions;
• a detector to detect the charge and/or current distributions that generated said interactions;
• a decomposer to decompose said interactions into a number of long-range interactions and a number of short-range interactions;
• a minimizer to minimize the number of long-range interactions by decomposing inter metalization interactions in a prescribed manner by performing a variable interaction range meshing process on said long-range interactions of said metalization sub units;
• and
• a second generator to generate, in accordance with prescribed criteria based on said obtained charge and/or current distributions and their prescribed relationships with said number of long-range interactions and said number of short-range interactions, electrical characteristics including at least impedance and admittance values of an overall physical metalization structure, for example, an inductor, interconnect or the like, to be fabricated.