X-ray irradiation apparatus and x-ray exposure apparatus

An X-ray irradiation apparatus, comprising:

• a target material feed-out device to provide a target material to a specified target position;
• a laser to irradiate the specified target position with laser light so that the target material forms a plasma that emits x-rays;
• and
• an x-ray generation position control device to determine and control a position of x-ray generation,
• wherein the x-ray generation position control device includes an x-ray generation position detector to detect the position of x-ray generation and a laser irradiation position control device to alter the position of laser light irradiation on the target material so that the specified target position is maintained.

An x-ray irradiation apparatus, comprising:

• a target material feed-out device to provide a target material in a feed-out direction to a specified target position;
• a laser to provide laser light to the specified target position, the laser light causing the target material to emit x-rays;
• and
• a rotary mechanism operatively connected to the target material feed-out device to axially rotate the target material feed-out device about the feed-out direction.

An x-ray irradiation apparatus, comprising:

• a target material feed-out device to provide a target material in a feed-out direction to a specified target position;
• a laser to provide laser light to the specified target position, the laser light causing the target material to emit x-rays;
• a target feed-out control device to detect and control the position of the target material feed-out device;
• and
• a moving mechanism operatively connected to the target material feed-out device to move the target material feed-out device so that the position of one of the target material feed-out device or a tip of the target material feed-out device is maintained at a specified position.

An x-ray irradiation apparatus, comprising:

• a target material feed-out device to provide a target material in a feed-out direction to a specified target position;
• a laser to provide laser light to the specified target position, the laser light causing the target material to emit x-rays;
• and
• a target feed-out control device to detect and control the position of the target material feed-out device,
• wherein the target feed-out control device includes at least one of a contact detection system or non-contact detection system.

An x-ray exposure apparatus for exposing a mask pattern of a mask onto a substrate, the x-ray exposure apparatus comprising:

• a target material feed-out device to provide a target material in a feed-out direction to a specified target position;
• a laser to provide laser light to the specified target position, the laser light causing the target material to emit x-rays;
• a rotary mechanism operatively connected to the target material feed-out device to axially rotate the target material feed-out device about the feed-out direction;
• and
• an x-ray optical system to direct the x-rays to the substrate via the mask such that the mask pattern is exposed onto the substrate.

An x-ray exposure apparatus for exposing a mask pattern of a mask onto a substrate, the x-ray exposure apparatus comprising:

• a target material feed-out device to provide a target material in a feed-out direction to a specified target position;
• a laser to provide laser light to the specified target position, the laser light causing the target material to emit x-rays;
• a target feed-out control device to detect and control the position of the target material feed-out device;
• and
• an x-ray optical system to direct the x-rays to the substrate via the mask such that the mask pattern is exposed onto the substrate.