Exposure method
AssigneeCanon Kabushiki Kaisha
InventorsMitsuaki Amemiya, Shunichi Uzawa, Yutaka Watanabe
Life of this patent
Estimating the term…
Abstract
An exposure method for transferring a pattern of a mask onto a workpiece in a proximity exposure system, includes a first exposure step for exposing a predetermined portion of the workpiece, while maintaining a first spacing between the mask and the workpiece, and a second exposure step for exposing the predetermined portion of the workpiece, while maintaining a second spacing, different from the first spacing, between the mask and the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.
Claims34
A device, comprising:
- a substrate;
- and
- a circuit pattern formed on said substrate in accordance with a procedure which includes (i) transferring a pattern of a mask onto a workpiece in a proximity exposure system, including (a) a first exposure process for exposing a predetermined portion of the workpiece, while maintaining a first spacing between the mask and the workpiece, and (b) a second exposure process for exposing the predetermined portion of the workpiece, while maintaining a second spacing, different from the first spacing, between the mask and the workpiece, wherein exposures in the first and second exposure processes are performed superposedly, prior to a development process, and (ii) developing the workpiece having said pattern transferring step performed thereto, whereby a circuit pattern can be produced on the developed workpiece.
An exposure method using a proximity exposure system, said method comprising:
- a first exposure step for exposing a predetermined portion of a workpiece, while maintaining a first spacing between a first mask and the workpiece, to form an image of the first mask at a predetermined position on the workpiece, wherein the first mask and the image of the first mask include a periodic pattern portion, and the period of the periodic pattern portion of the period of the image of the first mask is substantially equal to 1/n times the period of the periodic pattern portion of the first mask, wherein n is an integer not less than 2;
- and
- a second exposure step for exposing the predetermined portion of the workpiece, while maintaining a second spacing different for the fist spacing, between a second mask and the workpiece,
- wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.
An exposure method using a proximity exposure system, said method comprising:
- a first exposure step for exposing a predetermined portion of a workpiece, while maintaining a first spacing between a first mask and the workpiece;
- a second exposure step for exposing the predetermined portion of the workpiece, while maintaining a second spacing, different from the first spacing, between a second mask, and the workpiece,
- wherein the second mask has a smallest linewidth which is at least twice a smallest linewidth of an image of the first mask.
An exposure method using a proximity exposure system, said method comprising:
- a first exposure step for forming an image of a first mask at a predetermined portion of a workpiece, while maintaining a first spacing between the first mask and the workpiece, wherein the first mask and the image of the first mask include a periodic pattern portion, and the period of the periodic pattern portion the image of the first mask is substantially equal to 1/n times the period of the periodic pattern portion of the first mask, wherein n is an integer not less than 2;
- and
- a second exposure step for exposing the predetermined portion of the workpiece, while maintaining a second spacing, different from the first spacing, between a second mask and the workpiece,
- wherein exposures in the first and second exposure steps are preformed superposedly, prior to a development process, a first region having an exposure amount less than an exposure threshold value is produced by said first exposure step, a second region having an exposure amount less than the exposure threshold value is produced by said second exposure step, and at least a portion of a third region in which the first and second regions are superposed one upon another has an exposure amount greater than the exposure threshold value.
Dependencies are inferred from the claim text.