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US 6,323,055 B1Granted
Tantalum sputtering target and method of manufacture
AssigneeThe Alta Group, Inc.
InventorsHarry Rosenberg, Bahri Ozturk, Guangxin Wang, Wesley LaRue
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Abstract
Described is a method for producing high purity tantalum, the high purity tantalum so produced and sputtering targets of high purity tantalum. The method involves purifying starting materials followed by subsequent refining into high purity tantalum.
Claims18
A method for producing high purity tantalum comprising the steps of:
- purifying K2TaF7 by a dissolution process;
- reacting purified K2TaF7 with a reducing agent to produce tantalum powder;
- and
- reacting said tantalum powder with iodine in a container.
1 more element
A method for producing high purity tantalum comprising reacting impure tantalum with iodine gas in a container and decomposing tantalum iodides on a filament.
A high purity tantalum producing method comprising:
- reacting a material comprising both tantalum and at least one impurity with iodine gas;
- forming a reaction product comprising iodides of tantalum and iodides of the at least one impurity;
- separating at least a portion of the tantalum iodides from the reaction product by fractional distillation;
- and
- decomposing the separated tantalum iodides on a filament.
2 more elements
A high purity tantalum producing method comprising:
- reacting a feed material comprising both tantalum and an impurity with iodine gas, the impurity comprising at least one of tungsten or molybdenum;
- forming a reaction product comprising iodides of tantalum;
- and
- decomposing the tantalum iodides on a filament and producing high purity tantalum containing a decreased amount of at least one of tungsten or molybdenum compared to the feed material.
1 more element
Dependencies are inferred from the claim text.