Exposure apparatus, method of making the apparatus, exposure method, and device and manufacturing method of the device
AssigneeNikon Corporation
InventorNobutaka Magome
Life of this patent
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Abstract
An exposure apparatus comprising a charged particle beam barrel movable parallel with a wafer for exposing a two-dimensional region (XY-two-dimensional region) of the wafer to a charged particle beam. The exposure can be performed by moving the charged particle beam barrel XY-two-dimensionally even if the wafer holder is fixed. Therefore, the footprint of the exposure apparatus is reduced to ¼ compared to conventional apparatus in which the charged particle beam barrel is fixed and wafer holder is two-dimensionally movable.
Claims37
An exposure apparatus comprising:
- a substrate holder holding a substrate;
- a charged particle beam barrel movable within a predetermined plane parallel to a surface of said substrate for exposing said substrate by irradiating a charged particle beam onto said substrate, and
- a measurement unit which obtains information related to a tilt of said enlarged particle beam barrel with respect to said predetermined plane.
A method of making an exposure apparatus, comprising:
- providing a substrate holder holding a substrate;
- providing a charged particle beam barrel movable within a predetermined plane parallel to a surface of said substrate for exposing said substrate by irradiating a charged particle beam onto said substrate;
- and
- providing a measurement unit which obtains information related to a tilt of said charged particle beam barrel with respect to said predetermined plane.
An method of exposing a substrate by the use of a charged particle beam, comprising:
- moving a charged particle beam barrel which irradiates said charged particle beam onto said substrate to expose a predetermined area of said substrate with said charged particle beam;
- and
- obtaining information related to measurement of a tilt of said charged particle beam barrel with respect to a predetermined plane parallel to a surface of said substrate.
Dependencies are inferred from the claim text.