Aqueous polish compositions containing acid-amine latexes
AssigneeRohm and Haas Company
InventorTheodore Tysak
Life of this patent
Estimating the term…
Abstract
Disclosed is the use of film-forming acid-amine latexes in aqueous polish compositions whereby the resulting film is durable, tough, and resistant to detergent, but amine-strippable. Such polish compositions are metal-free and contain relatively low levels of volatile organic compounds.
Claims5
An amine-strippable, detergent resistant aqueous polish composition comprising a self-crosslinking, ambient curing, film-forming acid-amine latex, the latex comprising between 0.5 and 12.5 wt % total acid functionality and between 1.0 and 22.5 wt % total amine functionality, based on the total monomer weight, wherein the acid-amine latex is an acid- and amine-functional polymer formed by the free-radical initiated polymerization process of:
- (a) first, copolymerizing an anhydride monomer with an ethylenically unsaturated monomer to produce an anhydride polymer, wherein the amount of anhydride monomer is between 0.1 and 50.0 wt % based on the total monomer weight;
- (b) followed by addition of base thereto;
- (c) followed immediately by addition of between 0.001 and 2.0 moles of diamine per mole of anhydride;
- and
- (d) allowing the components to react.
Dependencies are inferred from the claim text.