Cosmetic or dermatological compositions of polyurethane and/or polyurea block polycondensation products containing silicon grafts and their use
AssigneeL'oreal
InventorsNathalie Mougin, Jean Mondet
Life of this patent
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Abstract
Cosmetic or dermatological compositions, especially in the field of hair care, make-up and beauty or hygiene products, of polyurethane and/or polyurea block polycondensation products comprising a chain formed by the repetition of at least one polyurethane and/or polyurea block -[-M-]- containing a polysiloxane graft. The polycondensation compositions are preferably multiblock and comprise a chain which is also formed by the repetition of a polyurethane and/or polyurea block -[-N-]- containing nonionic groups and/or ionic groups and/or a polyurethane and/or polyurea block -[-G-]- containing oligomers of organic polymers and/or a polysiloxane block -[-L-]-.
Claims10
A composition comprising at least one polyurethane and/or polyurea block polycondensation product, wherein said product comprises a chain containing the repetition of at least one polyurethane and/or polyurea block -{-M-}- having the following formula (I):
- wherein
- X1 independently represents —O— or —NH—;
- D represents a segment of formula:
- in which Z is a trivalent hydrocarbon radical chosen from the radicals
- wherein a is an integer ranging from 1 to 10;
- and
- Q is a polysiloxane segment of formula (I′):
- wherein the radicals R1 are chosen from C1-C20 monovalent hydrocarbon, halohydrocarbon, and perhalogenated radicals which are free or substantially free from ethylenic unsaturation, and aromatic radicals, and m is an integer such that the average molecular weight, measured at the top of the GPC peak, of the polysiloxane segment, ranges from 300 to 50,000,
- R is a divalent radical selected from aliphatic, cycloaliphatic and aromatic radicals,
- wherein said block -{-M-}- includes a polysiloxane graft, and
- wherein said composition is a cosmetic or dermatological composition.
Dependencies are inferred from the claim text.